Hostname: page-component-76fb5796d-vfjqv Total loading time: 0 Render date: 2024-04-25T11:12:36.027Z Has data issue: false hasContentIssue false

Valence Hole Localization in Molecular Auger Decay

Published online by Cambridge University Press:  25 February 2011

D. A. Lapiano-Smith
Affiliation:
Department of Chemistry, State University of New York, Stony Brook, N.Y. 11794-3400
C. I. Ma
Affiliation:
Department of Chemistry, State University of New York, Stony Brook, N.Y. 11794-3400
K. T. Wu
Affiliation:
On leave from Department of Chemistry, State University of New York, College at Old Westbury, Old Westbury, New York 11568
D. M. Hanson
Affiliation:
Department of Chemistry, State University of New York, Stony Brook, N.Y. 11794-3400
Get access

Abstract

Studies of the unimolecular decay, following the excitation of core electrons of the carbon and fluorine atoms in carbon tetrafluoride and silicon and fluorine in silicon tetrafluoride by monochromatic, synchrotron radiation, provided evidence for a “valence bond depopulation” fragmentation mechanism. The fragmentation processes were examined using time-of flight mass spectroscopy. The mass spectra show the distribution of ions collected in coincidence with low and high energy electrons. Distinct changes in the mass spectra with atomic site of excitation and photon energy are observed. The observation of F2+ ions in the time-of-flight mass spectra following excitation of a fluorine is electron in SiF4 is significant because it provides direct evidence for the formation of a localized, two-hole, final valence state that persists on the time scale of fragmentation. In contrast, the lack of F2+ ions from CF4, indicates that the fragmentation occurs through a delocalized two-hole state.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. (a) Antonides, E., Janse, E.C., and Sawatsky, G.A., Phys. Rev. 81 5, 1669 (1977);CrossRefGoogle Scholar
(b) Sawatzky, G.A., Phys. Rev. Lett. 39, 504 (1977);CrossRefGoogle Scholar
(c) Sawatzky, G.A. and Lenselink, A., Phys. Rev. B 21, 1790 (1980).CrossRefGoogle Scholar
2. Cini, M., Surf. Sci. 87, 483 (1979); Solid State Commun. 20, 605 (1976); 24, 681 (1977); Phys. Rev. B 17, 2788 (1978).CrossRefGoogle Scholar
3. (a) Bassett, P.J., Gallon, T.E., Prutton, M., and Matthew, J.A.D., Surf. Sci. 33, 213 (1972); (b) D.R. Jennison, J. Vac. Sci. Technol. 20, 548 (1982).CrossRefGoogle Scholar
4. (a) Thomas, T.D. and Weightman, P., Chem Phys. Lett. 81, 325 (1981);CrossRefGoogle Scholar
(b) Weightman, P., Thomas, T.D., and Jennison, D.R., J. Chem. Phys. 78, 1652 (1983).CrossRefGoogle Scholar
5. Rye, R. R, Jennison, D.R., and Houston, J.E., J. Chem. Phys. 73, 4867 (1980).CrossRefGoogle Scholar
6. Rye, R.R., and Houston, J.E., J. Chem. Phys. 78, 4321 (1983).CrossRefGoogle Scholar
7. (a) Jennison, D.R., Kelber, J.A., and Rye, R.R., Phys. Rev. B 25, 1384 (1982); (b) P.J. Feibelman, Surf. Sci. 102, L51 (1981); (c) D.E. Ramaker, C.T. White, and J.S. Muday, J. Vac. Sci. Technol. 18, 748 (1981).CrossRefGoogle Scholar
8. Murakami, J., Nelson, M.C., Anderson, S.L., Hanson, D.M., J. Chem. Phys., 85. 5755 (1986)CrossRefGoogle Scholar
9. Lapiano-Smith, D.A., Ma, C.I., Wu, K.T. and Hanson, D.M., J. Chem. Phys., in press.Google Scholar
10. Saito, N. and Suzuki, I.H., Chem. Phys. Lett. 129, 419 (1986).CrossRefGoogle Scholar
11. Rye, R.R. and Houston, J.E., Acc. Chem. Res. 17, 41 (1984).CrossRefGoogle Scholar