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Uv-Ozone Cleaning of GaAs (100) Surfaces for Device Applications

  • J. S. Solomon (a1) and S. R. Smith (a1)

Abstract

GaAs (100) substrates were subjected to UV-ozone, wet chemical, and thermal treatments prior to deposition of Ni contact structures. The use of UV-ozone showed marked improvement in the electrical characteristics compared to the wet chemical and thermal treatments alone. The major effect of UV-ozone is the nondestructive removal of carbonous contaminants. Results of C-V and I-V barrier height measurements on Ni contact structures fabricated on the treated surfaces are presented.

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Uv-Ozone Cleaning of GaAs (100) Surfaces for Device Applications

  • J. S. Solomon (a1) and S. R. Smith (a1)

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