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UV Photon-Assisted Refractory Metal Deposition

  • G. A. Kovall (a1), J. C. Matthews (a2) and R. Solanki (a1)

Abstract

We have been investigating deposition of tungsten and molybdenum films at lover temperatures than conventional CVD processes with the aid of ultraviolet photons. The photon source is a high intensity, medium-pressure mercury lamp. W and Mo films have been deposited from their respective hexacarbonyls. W films have also been obtained by photon enhanced reduction of tungsten hexafluoride. In all cases films were deposited over 75 mm diameter substrates, which included quartz, silicon dioxide, and silicon wafers. The deposition system, conditions and the properties of the photodeposited films are presented.

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[1] Brown, D. M., Cady, W. R., Sprague, J. W., and Salvagni, P. J., IEEE Trans. Electron Devices ED–18, 931 (1971).
[2] Engeler, W. E. and Brown, D. M., IEEE Trans. Electron Devices ED–19, 54 (1972).
[3] Shaw, J. M. and Amick, J. A., RCA Review, June 1970, p. 306.
[4] Merchant, P. P., Hewlett-Packard Journal, August 1982, p. 28.
[5] Brors, D. L., Monnig, K. A., Fair, J. A., Coney, W. and Saraswat, K. C., Solid State Technol. 27, 313 (1984).
[6] Cohen, S. S., Kim, M. J., and Brown, D. M., Appl. Phys. Lett. 46, 657 (1985).
[7] Solanki, R., Boyer, P. K., Mahan, J. E., and Collins, G., Appl. Phys. Lett. 38, 572 (1981).
[8] Ehrlich, D. J., Osgood, R. M. Jr, and Deutsch, T. F., J. Electrochem. Soc. 128, 2040 (1981).
[9] Solanki, R., Boyer, P. K., and Collins, G., Appl. Phys. Lett. 41, 1048 (1982).
[10] Deutsch, T. F. and Rathman, D. D., Appl. Phys. Lett. 45, 623 (1984).
[11] Creighton, J. R., J. Appl. Phys. 59, 410 (1986).
[12] Lundquist, R. T. and Cais, M., J. Organic Chem. 27, 1167 (1962).
[13] Tanner, K. N. and Duncan, A. B. F., J. Am. Chem. Soc. 73, 1164 (1951).
[14] Marosan, C. E. and Soltuz, V., Thin Solid Films 52, 181 (1978).
[15] Miller, N. E. and Beinglass, I., Solid State Technol. 23, 79 (1980); 25, 85 (1982).
[6] Broadbent, E. K. and Ramiller, C. L., J. Electrochem. Soc. 131, 1427 (1984).
[17] Green, M. L. and Levy, R. A., J. Electrochem. Soc. 132, 1243 (1985).

UV Photon-Assisted Refractory Metal Deposition

  • G. A. Kovall (a1), J. C. Matthews (a2) and R. Solanki (a1)

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