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The Use of Xanthates as Precursors for the Deposition of Nickel Sulfide Thin Films by Aerosol Assisted Chemical Vapour Deposition

  • P.L. Musetha (a1), N. Revaprasadu (a1), M.A Malik (a2) and P. O'Brien (a2)

Abstract

Nickel sulphide (NiS) thin films have been deposited on glass by aerosol assisted chemical vapour deposition(AACVD) using single source precursors of the type, ([Ni(S2COR2)2], R = C2H5 or C3H7). TGA analyses showed that the precursors are highly volatile, making them suitable for AACVD studies. As deposited NiS films were polycrystalline as confirmed by XRD. The films have been characterised by xray diffraction (XRD), scanning electron microscopy (SEM), and Energy dispersive analysis of x-rays (EDAX).

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The Use of Xanthates as Precursors for the Deposition of Nickel Sulfide Thin Films by Aerosol Assisted Chemical Vapour Deposition

  • P.L. Musetha (a1), N. Revaprasadu (a1), M.A Malik (a2) and P. O'Brien (a2)

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