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The Use of AlN Interlayers to Improve GaN Growth on A-Plane Sapphire

Published online by Cambridge University Press:  15 March 2011

D.D. Koleske ,
M.E. Twigg ,
A.E. Wickenden ,
R.L. Henry ,
R.J. Gorman ,
J.A. Freitas Jr.  and
M. Fatemi
D.D. Koleske
Affiliation:
Code 6800, Electronics Science and Technology Division, Naval Research Laboratory, Washington, D.C. 20375
M.E. Twigg
Affiliation:
Code 6800, Electronics Science and Technology Division, Naval Research Laboratory, Washington, D.C. 20375
A.E. Wickenden
Affiliation:
Code 6800, Electronics Science and Technology Division, Naval Research Laboratory, Washington, D.C. 20375
R.L. Henry
Affiliation:
Code 6800, Electronics Science and Technology Division, Naval Research Laboratory, Washington, D.C. 20375
R.J. Gorman
Affiliation:
Code 6800, Electronics Science and Technology Division, Naval Research Laboratory, Washington, D.C. 20375
J.A. Freitas Jr.
Affiliation:
Code 6800, Electronics Science and Technology Division, Naval Research Laboratory, Washington, D.C. 20375
M. Fatemi
Affiliation:
Code 6800, Electronics Science and Technology Division, Naval Research Laboratory, Washington, D.C. 20375
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Abstract

The lack of a suitable, lattice matched substrate for the growth of the group III nitrides typically restricts GaN film growth to substrates such as sapphire or SiC, despite the large lattice and thermal mismatch. With the use of AlN or GaN nucleation layers (NL), GaN films of sufficient quality have been produced for blue LEDs. However, for laser and large-area microwave device applications, the large number of dislocations (> 108 cm−2) limit device performance, and techniques are desired to reduce dislocation density during the growth process. Here, we demonstrate how low temperature AlN interlayers (IL) sandwiched between high temperature (HT) GaN layers can be used to improve the electrical, optical, and structural properties of Si doped GaN films. A nearly two-fold increase in mobility is observed in Si doped GaN grown using 5 AlN IL compared to GaN grown on a single AlN NL. For GaN films grown on multiple AlN IL, cross-sectional transmission electron microscopy images reveal a significant reduction in the screw dislocation density and photoluminescence spectra reveal a reduction in yellow band intensity. An analysis of the electrical data based on a single donor/single acceptor model suggests that the improved electron mobility is the result of a reduced acceptor concentration in the top GaN film. The reduction in the calculated acceptor concentration may be associated with the reduction of the screw dislocation density.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 587: Symposium O – Substrate Engineering - Paving the Way to Epitaxy , 1999 , O7.3
Copyright
Copyright © Materials Research Society 2000

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