Skip to main content Accessibility help
×
Home

Use of A New High Speed Acrylate Deposition Process to Make Novel Multilayer Structures

  • David G. Shaw (a1) and Marc G. Langlois (a1)

Abstract

A new process has been developed to deposit acrylate thin films at speeds of 1500 ft/minute or higher. These films range in thickness from a few hundred Angstroms to a fewmicrons and are uniform in thickness to within 5%. They can vary in refractive index from 1.35 to 1.60 and have mechanical properties from very hard and abrasion resistantto very soft and flexible.

The acrylate deposition process was originally developed for multilayer acrylate/aluminum capacitors where over 10,000 layer structures were produced[l]. The process is compatible with other vapor deposition processes such as sputtering, evaporation, and CVD. Both processes can take place at the same time in the same vacuum chamber toproduce various multilayer structures.

This paper will discuss some of the features of this process and the associated equipment. It will present examples of the wide range of acrylate/acrylate, acrylate/metal, and acrylate/inorganic material structures that can be made. It will discuss various applications for these structures.

Copyright

References

Hide All
1. Yializis, A., Powers, G., Shaw, D.G., “A New High Temperature Multilayer Capacitor with Acrylate Dielectrics”, IEEE Transactions on Components, Hybrids, and Manufacturing Technology, Vol. 13, No. 4, December, 1990.
2. Shaw, D.G., “A new High Speed Vapor Deposition Process for Applying Acrylate Coatings”, Conference Proceedings of the 1992 Radtech Conference in Boston.
3. Shaw, D.G., Langlois, M.G., “Use of Vapor Deposited Acrylate Coatings to Improve the Barrier Properties of Metallized Film”, Conference Proceedings of the Society of Vacuum Coaters, Boston, 1994.
4. Shaw, D.G., Langlois, M.G., “A New High Speed Process for Vapor Depositing Fluoro and Silicone Acrylates for Release Coating Applications”, Conference Proceedings of the Society of Vacuum Coaters, Chicago, 1995.

Related content

Powered by UNSILO

Use of A New High Speed Acrylate Deposition Process to Make Novel Multilayer Structures

  • David G. Shaw (a1) and Marc G. Langlois (a1)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed.