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Transport Measurements of Magnetic Multilayers at Reduced Lateral Dimensions

  • Y.D. Park (a1), H.D. Hudspeth (a2), T.J. Schultz (a2), A. Cabbibo (a1), J. A. Caballero (a1), F. Sharifi (a2) and J.R. Childress (a1)...

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Abstract We report on the fabrication and transport properties of magnetic multilayers with widths down to 100 nm. We employ e-beam processed nano-deposition masks to pattern magnetic multilayers which define nano-wires by lift-off or by a removal process such as ion-milling. Two different magnetic multilayer systems (antiferromagnetically coupled Co/Cu multilayers and NiFe/Cu/Co spin-valves) are investigated. Structures resulting from the lift-off process show high contact resistance and high resistivities while ion-milled structures show resistivities close to that of bulk. For Fe(50Å)/[Co(15Å)/Cu(20Å)]x20 /Cu(30Å), patterned nano-wire structures display no negative magnetoresistance but a positive magnetoresistance that is linear with applied field and no apparent hysteresis. For Ta(50Å)/NiFe(50Å)/Cu(35Å)/Co(20Å)/Cu(30Å), we found the resistance to decrease as the absolute value of magnetic field is decreased and found hysteresis to be present.

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6. Park, Y.D., Caballero, J.A., Cabbibo, A., Childress, J.R., Hudspeth, H.D., Schultz, T.J., and Sharifi, F. to be published in J. Appl. Phys.

Transport Measurements of Magnetic Multilayers at Reduced Lateral Dimensions

  • Y.D. Park (a1), H.D. Hudspeth (a2), T.J. Schultz (a2), A. Cabbibo (a1), J. A. Caballero (a1), F. Sharifi (a2) and J.R. Childress (a1)...

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