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Thin Films of Ferroelectrics Made by Pulsed Laser Deposition for Optoelectronic Applications

  • D.B. Chrisey (a1), L.A. Knauss (a1) (a2), J.S. Horwitz (a1), R.C.Y. Auyeung (a3), D. Knies (a1) (a4), K.S. Grabowski (a1), E.P. Donovan (a1), K. Mccallion (a5) and W. Johnstone (a5)...

Abstract

We have deposited ferroelectric thin films by pulsed laser deposition to be used as an inline optoelectronic modulator utilizing evanescent field coupling to a side-polished optical fiber. In order to satisfy waveguiding conditions, amorphous quartz substrates (n= 1.447) were necessary. Ferroelectric films of (Pb0.91La0.90)(Zr0.65,Ti0.35)O3, Pb0.80La0.20TiO3 (PLZT), and Sr0.5Ba0.5TiO3 were deposited on quartz substrates and thin Bi4Ti3O12 buffer layers were explored as a chemical barrier and to improve crystallographic texturing. The morphology of thick films (˜3 µm) of PLZT was not acceptable for optical applications, whereas the Sr0.5Ba0.5TiO3 films were very smooth, but had some cracking. The Sr0.5Ba0.5TiO3 films were optically determined to be uniform and of sufficient quality for use in fabricating in-line fiber optic modulators.

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Thin Films of Ferroelectrics Made by Pulsed Laser Deposition for Optoelectronic Applications

  • D.B. Chrisey (a1), L.A. Knauss (a1) (a2), J.S. Horwitz (a1), R.C.Y. Auyeung (a3), D. Knies (a1) (a4), K.S. Grabowski (a1), E.P. Donovan (a1), K. Mccallion (a5) and W. Johnstone (a5)...

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