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Thin Films of Ferroelectrics Made by Pulsed Laser Deposition for Optoelectronic Applications

Published online by Cambridge University Press:  15 February 2011

D.B. Chrisey
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345
L.A. Knauss
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345 NRL/NRC Postdoctoral Research Associate
J.S. Horwitz
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345
R.C.Y. Auyeung
Affiliation:
SFA Inc., Landover, MD 20785
D. Knies
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345 NRL/ASEE Postdoctoral Research Associate
K.S. Grabowski
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345
E.P. Donovan
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375-5345
K. Mccallion
Affiliation:
University of Strathclyde, Glasgow, United Kingdom
W. Johnstone
Affiliation:
University of Strathclyde, Glasgow, United Kingdom
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Abstract

We have deposited ferroelectric thin films by pulsed laser deposition to be used as an inline optoelectronic modulator utilizing evanescent field coupling to a side-polished optical fiber. In order to satisfy waveguiding conditions, amorphous quartz substrates (n= 1.447) were necessary. Ferroelectric films of (Pb0.91La0.90)(Zr0.65,Ti0.35)O3, Pb0.80La0.20TiO3 (PLZT), and Sr0.5Ba0.5TiO3 were deposited on quartz substrates and thin Bi4Ti3O12 buffer layers were explored as a chemical barrier and to improve crystallographic texturing. The morphology of thick films (˜3 µm) of PLZT was not acceptable for optical applications, whereas the Sr0.5Ba0.5TiO3 films were very smooth, but had some cracking. The Sr0.5Ba0.5TiO3 films were optically determined to be uniform and of sufficient quality for use in fabricating in-line fiber optic modulators.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1 Gloag, A., Langford, N., McCallion, K., and Johnstone, W., Appl. Phys. Lett. 66, 3263 (1995).Google Scholar
2 McCallion, K., Johnstone, W., and Fawcett, G., Optics Lett. 19, 542 (1994).Google Scholar
3 Johnstone, W., Thursby, G., Moodie, D., and McCallion, K., Optics Lett. 17, 1538 (1992).Google Scholar
4 Moodie, D.G., Johnstone, W., Thursby, G., and McCallion, K., SPIE 1796, 45 (1992).Google Scholar
5 Johnstone, W., Moodie, D., Thursby, G., Murray, S., Gill, M., McDonach, A., and Culshaw, B., SPIE 1580, 259 (1991).Google Scholar
6 McCallion, K., Johnstone, W., and Thursby, G., SPIE 1580, 263 (1991).Google Scholar
7 Pulsed Laser Deposition of Thin Films, edited by D.B. Chrisey and G.K. Hubler, Wiley, New York, 1994.Google Scholar
8 Ziong, S.B., Liu, Z.G., Chen, X.Y., Guo, X.L., Liu, X., and Zhu, S.N., Appl. Phys. Lett. 67, 2729 (1995).Google Scholar
9 Kim, D.H. and Kwok, H.S., Appl. Phys. Lett. 67, 1803 (1995).Google Scholar
10 Quadri, S.B.et al., Appl. Phys. Lett. 67, 1605 (1995).Google Scholar
11 Krupanidhi, S.B., Hu, H., and Kumar, V., J. Appl. Phys. 71, 376 (1992).Google Scholar
12 Adachi, H. and Wasa, K., IEEE Trans, on Ultrason., Ferro., and Freq. Cont. 38, 645 (1991).Google Scholar
13 Ramakrishnan, E.S. and Howng, W., J. Vac. Sci. Technol. A 10, 69, (1992).Google Scholar
14 Ramesh, R., Lee, J., Sands, T., Keramidas, V.G., and Auciello, O., Appl. Phys. Lett. 64, 2511 (1994).Google Scholar
15 Ramesh, R., Sands, T., and Keramidas, V.G., J. Electr. Mater. 23, 19 (1994).Google Scholar