Hostname: page-component-8448b6f56d-tj2md Total loading time: 0 Render date: 2024-04-23T18:25:24.646Z Has data issue: false hasContentIssue false

Thermal Stability of Strained InGaAs/GaAs Single Quantum Wells

Published online by Cambridge University Press:  28 February 2011

B. Elman
Affiliation:
GTE Laboratories Incorporated, Waltham, MA 02254
Emil S. Koteles
Affiliation:
GTE Laboratories Incorporated, Waltham, MA 02254
P. Melman
Affiliation:
GTE Laboratories Incorporated, Waltham, MA 02254
C.A. Armiento
Affiliation:
GTE Laboratories Incorporated, Waltham, MA 02254
C. Jagannath
Affiliation:
GTE Laboratories Incorporated, Waltham, MA 02254
Get access

Abstract

We present a study of the structural stability of InGaAs/GaAs strained single quantum wells (SQW) grown with a variety of indium compositions and with well widths close to critical thickness values. The samples were grown by molecular beam epitaxy and were subjected to furnace annealing as well as ion implantation followed by rapid thermal annealing. Changes in low temperature photoluminescence linewidths were used to evaluate the stability of strained SQWs. We observed both strain relief, in wide SQWs and strain recovery, in higher indium composition narrow quantum wells which were partially relaxed (low dislocation density) as-grown.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1Elman, B., Koteles, Emil S., Melman, P., Jagannath, C., Lee, J. and Dugger, D., Appl Phys. Lett. 55, 1659 (1989).Google Scholar
2Peercy, P.S., Dodson, B.W., Tsao, J.Y., Jones, E.D., Myers, D.R., Biefeld, R.M., Klem, J.F., and Hills, C.R., IEEEEDL-9, 621 (1988).Google Scholar
3Zipperian, T.E., Jones, E.D., Dodson, B.W., Klem, J.F., Gourley, P.L., and Plut, T.A., Proceedings of 15th International Symposium on GaAs and Related Compounds, Inst.Phys. Conf. Ser. 96, 365 (1988).Google Scholar
4Nickel, H., Losch, R., Schlapp, W., Leier, H., and Forchel, A., Workbook of the 4th International Conference on Modulated Semiconductor Structures, Ann Arbor, MI, July 1989, p. 527.Google Scholar
5Koteles, Emil S., Elman, B., Melman, P., and Armiento, C.A., Proceedings of this Symposium.Google Scholar
6Elman, B., Koteles, Emil S., Melman, P., and Armiento, C.A., J. Appl. Phys. 66, 2104 (1989).Google Scholar
7Prince, F.C. and Armiento, C.A., IEEEEDL-7, 23 (1986).Google Scholar
8Matthews, J.W. and Blakeslee, A.E., J. Cryst. Growth 27, 118 (1974).Google Scholar
9Andersson, T.G., Chen, Z.G.Kulakovskii, V.D., Uddin, A., and Vallin, J.T., Appl. Phys. Lett. 51, 752 (1987); Phys. Rev. B37,4032 (1988).Google Scholar
10Anderson, N.G., Laidig, W.D., Kolbas, R.M., and Lo, Y.C., J. Appl. Phys. 60, 2361 (1986).Google Scholar
11Grundmann, M., Lienert, U., and Bimberg, D., Appl Phys. Lett. 55, 1765 (1989).Google Scholar
12Koteles, Emil S., Elman, B., Melman, P., Jagannath, C., Armiento, C.A., and Rothman, M., Appl Phys. Lett, (to be published).Google Scholar