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Thermal Stability of Sputter Deposited Tantallum Silicide Films
Published online by Cambridge University Press: 15 February 2011
Abstract
Tantallum silicide films were sputter deposited from targets with different Si/Ta stoichiometries. The films were then subjected to thermal treatments. Silicon precipitation was observed on films deposited from silicon rich targets. The effects of silicon precipitates on device characteristics was studied. A method to suppress silicon precipitation is reported.
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- Copyright © Materials Research Society 1991