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Temperature Dependence of the Optical Properties for InN Films Grown by RF-MBE

  • Y. Ishitani (a1) (a2) (a3), K. Xu (a3), W. Terashima (a1), H. Masuyama (a1), M. Yoshitani (a1), N. Hashimoto (a1), S. B. Che (a1) (a2) (a3) and A. Yoshikawa (a1) (a2) (a3)...

Abstract

InN epitaxial layers are grown on sapphire substrates. The investigated samples have electron concentration in a range of 1.8 ×1018 − 1.1 ×1019 cm-3. Optical reflection and transmission measurements are performed. The plasma edge energy position in the spectra is constant in a measurement temperature range of 5 – 300 K. The reflection and transmission spectra are calculated on the basis of the LO phonon-electron coupling scheme and non-parabolic conduction band structure. From this analysis we find that the observed absorption edge is attributed to valence band to conduction band transition rather than the valence band to defect (impurity) band transition, and the intrinsic bandgap energy of 0.64 (±0.03) eV. This bandgap energy increases by 40 – 50 meV as the temperature decreases from 295 to 10 K.

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Temperature Dependence of the Optical Properties for InN Films Grown by RF-MBE

  • Y. Ishitani (a1) (a2) (a3), K. Xu (a3), W. Terashima (a1), H. Masuyama (a1), M. Yoshitani (a1), N. Hashimoto (a1), S. B. Che (a1) (a2) (a3) and A. Yoshikawa (a1) (a2) (a3)...

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