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Temperature Control and Temperature Uniformity During Rapid Thermal Processing

Published online by Cambridge University Press:  28 February 2011

Peter Vandenabeele  and
Karen Maex
Peter Vandenabeele
Affiliation:
Interuniversity Microelectronics Center (IMEC vzw) Kapeldreef 75, B-3001, Leuven, Belgium
Karen Maex
Affiliation:
Interuniversity Microelectronics Center (IMEC vzw) Kapeldreef 75, B-3001, Leuven, Belgium
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Abstract

An overview is given of the major problems in temperature control and uniformity control. For temperature control varying emissivity due to layers, roughness, doping and chamber design are discussed, together with problems due to lamp radiation. The main way to go seems to be in-situ emissivity correction. For uniformity control, the main problems are non-uniform reflector radiation and patteren induced non-uniformity. The solution seems to be the design of a reflective chamber with uniform reflected radiation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 224: Symposium F – Rapid Thermal and Integrated Processing I , 1991 , 185
Copyright
Copyright © Materials Research Society 1991

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