Skip to main content Accessibility help
×
Home

Surface Fluorination of Polyimide Thin Films by CF4 + O2 Reactive Ion Beam Etching

  • William E. Vanderlinde (a1) and Arthur L. Ruoff (a1)

Abstract

Surface fluorination of polyimide thin films during CF4 + O2 reactive ion beam etching (RIBE) was investigated. The removal of the fluorinated layer by a subsequent oxygen ion beam etch was also studied. Electron spectroscopy for chemical analysis (ESCA) and Rutherford backscattering spectrometry (RBS) detected a fluorinated surface layer on the order of 100 A thick. Fluorine atom concentration in the surface of the film (as measured by RBS) and the etch rate of the film were measured as a function of several experimental parameters: ion energy, ion current density, etch time, and gas composition. The results are compared with theoretical predictions of the total number of fluorine atoms retained in the film after etching.

Copyright

References

Hide All
1. Wilson, A.M., Thin Solid Films 83, 145 (1981).
2. Wilson, A.M., in Polyimides: Synthesis, Characterization, and Applications, edited by Mittal, K.L. (Plenum, New York, 1984), p. 715.
3. Wach, J., in Polyimides: Synthesis, Characterization, and Applications, edited by Mittal, K.L. (Plenum, New York, 1984), p. 841.
4. Clark, D.T., Feast, W.J., Musgrave, W.K.R., and Ritchie, I., J. Polym. Sci. Polym. Chem. Ed., 13, 857 (1975).
5. Dedinas, J., Feldman, M.M., Mason, M.G., and Gerenser, L.J., in Proceedings of the First International Conference on Plasma Chemistry and Technology, edited by Boenig, Herman (Technomic, Lancaster, PA, 1983), p. 119.
6. Anand, M., Cohen, R.E. and Baddour, R.F., Polymer 22, 361 (1981).
7. Hu, H.K., Schultz, J.A. and Rabalais, J.W., J. Phys. Chem. 86, 3364 (1982).
8. Egitto, F.D., Emmi, F., Horwath, R.S., and Vukanovic, V., J. Vac. Sci. Technol. B 3(3), 893 (1985).
9. Vukanovic, V., Takacs, G.A., Matuszak, E.A., Egitto, F.D., Emmi, F., and Horwath, R.S., J. Vac. Sci. Technol. A 4(3), 698 (1986).
10. Harper, J.M.E., Cuomo, J.J., and Kaufman, H.R., Annu. Rev. Mater. Sci. 13, 413 (1983).
11. Vanderlinde, W.E., Mills, P.J., Kramer, E.J., and Ruoff, A.L., J. Vac. Sci. Technol. B 3(5), 1362 (1985).
12. Doolitte, L.R., Nucl. Instrum. Method. B 9, 344 (1985).
13. Ziegler, J.F., Helium, Stopping Powers, and Ranges in all Elements (Pergamon, New York, 1977).
14. Storp, S. and Holm, R., J. Electron Spectrosc. Relat. Phenom., 16, 183 (1979).
15. Mayer, T.M. and Barker, R.A., J. Electrochem. Soc. 129, 585 (1982).
16. Harper, J.A.E., Cuomo, J.J. and Kaufman, H.R., J. Vac-.-Sci. Technol. 21(3), 737 (1982).
17. Ertl, G. and Kuppers, J., Low Energy Electrons and Surface Chemistry (VCH, Deerfield Beach, FL, 1985), p. 82.
18. Feldman, L.C. and Mayer, J.W., Fundamentals of Surface and Thin Film Analysis (North-Holland, New York, 1986), p. 129.
19. Charvat, P.K., Krueger, E.E. and Ruoff, A.L., J. Vac. Sci. Technol. B 4(4), 812 (1986).

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed