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Subsurface Damage Characterization of Hydrogen Ion Implanted Silicon Wafer with Uv/Millimeter-Wave Technique

  • Yoh-Ichiro Ogita (a1), Ken-Ichi Kobayashi (a1), Masaki Kurokawa (a1), Hideyuki Kondo (a2) and Takeo Katoh (a1)...

Abstract

The UV/mm-wave technique composed of ultraviolet photoexcitation and millimeter wave probe was examined with photoconductivity amplitude (PCA) to characterize the slight subsurface damage induced by implanting H2 + ion into the subsurface at sub micron depth of Si wafers. The identical samples were also characterized using pulse photoconductivity amplitude (PPCA) obtained by another technique which is specified by blue laser photoexcitation and microwave probe. PCA decreased with increase of ion dose, which coincided well with the result in PPCA. PPCA decreased with increase of implantation energy as 90 to 120 keV, but PCA increased at 120keV. Both PCA and PPCA well reflected the damage at sub micron depth. PCA reflected damage in shallower depth compared to PPCA.

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2. Ogita, Y., Hosoda, Y., and Miyazaki, M., in Science and Technology of Semiconductor Surface Preparation, edited by Higashi, G.S., Hirose, M., Raghavan, S., and Verhaverbeke, S., (Materials Research Society, 477, Warrendale, PA, 1997), pp. 209214.
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4. Ogita, Y., Nakano, M., and Masumura, H., in Defect and Impurity Engineered Semiconductors and Devices, edited by Ashok, S., Chevsllier, J., Akasaki, I., Johnson, M. M., and Sopori, B. L., (Materials Research Society, 378, Warrendale, PA, 1995), pp. 591596.
5. Ogita, Y., Kobayashi, K., Daio, H., J. Crystal Growth, 210 pp. 3639(2000)
6. Katoh, T., Kondo, H., Takaishi, K., Tominaga, M., Ogita, Y., Kobayashi, K. and Gan-nen, Y., in Extended Abstracts of the 59th Fall Meeting, The Japan Society of Appl. Phys., (The Japan Society of Applied Physics, No. 2, Tokyo, 1998) P. 690
7. Ogita, Y., Shinohara, H., Sawanobori, T., and Kurokawa, M., in In-Line Characterization Technique for Performance and Yield Enhancement in Microelectronic Manufacturing II (The International Society for Optical Engineering (SPIE), 3509, Bellingham, WA, 1998), pp. 65–7
8. Ogita, Y. and Kawasaki, K. in Extended Abstracts of the 46th Spring Meeting, The Japan Society of Applied Physics, (The Japan Society of Applied Physics, No. 2, Tokyo, 1999), p. 824

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