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Submicron, Noble Metal Particle Reference Standards: A Proposal

  • R. S. Hockett (a1), Angela Y. Craig (a1) and Diem Le (a1)

Abstract

There is a need in the semiconductor industry to develop new techniques and instrumentation for the elemental and chemical analysis of submicron, particularly <0.2 μm, particles. The development of these techniques and instrumentation could be assisted by submicron particle reference standards. We propose that high number-density, noble metal (Cu, Ag, Au) particles on silicon, with controlled diameters in the range of 0.02 μm to 0.10 μm, be developed and used as particle reference standards.

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