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Study on Hydrophobic a-C:H:F Overcoat Layer for a-Si:H Photoreceptor

Published online by Cambridge University Press:  26 February 2011

Fuhinori Ishikawa ,
K. Tamahashi ,
M. Chigasaki ,
S. Onuma ,
M. Wakagi ,
T. Ohno ,
Y. Shimamura  and
C. Yamagishi
Fuhinori Ishikawa
Affiliation:
Hitachi Research Lab., Hitachi Ltd., Hitachi city, JAPAN
K. Tamahashi
Affiliation:
Hitachi Research Lab., Hitachi Ltd., Hitachi city, JAPAN
M. Chigasaki
Affiliation:
Hitachi Research Lab., Hitachi Ltd., Hitachi city, JAPAN
S. Onuma
Affiliation:
Hitachi Research Lab., Hitachi Ltd., Hitachi city, JAPAN
M. Wakagi
Affiliation:
Hitachi Research Lab., Hitachi Ltd., Hitachi city, JAPAN
T. Ohno
Affiliation:
Hitachi Research Lab., Hitachi Ltd., Hitachi city, JAPAN
Y. Shimamura
Affiliation:
Yamazaki Works, Hitachi Chemical Co. Ltd., Hitachi city, JAPAN
C. Yamagishi
Affiliation:
Yamazaki Works, Hitachi Chemical Co. Ltd., Hitachi city, JAPAN
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Abstract

To solve an image degradation problem of blurring for a-Si:H photoreceptors during the repetitions of electrophotographic process, effect of a-C:H:F overcoat layer has been investigated. The film is deposited by glow discharge decomposition of C2 F6 and H2 mixture gases. The hydrophobic property of the film is estimated by contact angle of water drop. The contact angle of a-C:H:F is larger than that of a-SiC:H especially after 5 hours corona exposure treatment. In the printing test, the blurring life time of a-C:H:F overcoated a-Si:H photoreceptor becomes longer about 9 times than that of a-SiC:H overcoated one.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 118: Symposium E – Amorphous Silicon Technology , 1988 , 429
Copyright
Copyright © Materials Research Society 1988

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References

Refrences

1. Tanielian, M., Chatani, M., Fritzsche, H., Smid, V., and Persams, P. D., J. Non-Crystalline Solids, 35 & 36, 575–580 (1980)Google Scholar
2. Mort, J., Jansen, F., Grammatica, S., Morgan, M., and Chen, I., J. AppI. Phys. 55 (8), 3197–3198 (1984)CrossRefGoogle Scholar
3. Kakinuma, H., Fukuda, H., Nishikawa, S., Watanabe, T., and Nihei, K., J. Appl. Phys. 61 (9), 4679–4681 (1987)Google Scholar
4. Tamahashi, K., Ishikawa, F., Onuma, S., Wakagi, M., Ohno, T., Chigasaki, M., Shimamura, Y. and Yamagishi, C., Electrophotography, 27 (1),(1988)Google Scholar