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Study on Dipole Layer Formation between Two Oxides : Experimental Evidences and Possible Models

  • Koji Kita (a1) and Akira Toriumi (a1)

Abstract

Hetero-interface between two oxides sometimes forms a dipole layer which is experimentally observable macroscopically, as an electric potential barrier at the interface. Investigation of the flatband voltage shift of the metal-insulator-semiconductor capacitors with bilayer oxides as the insulator is suitable to characterize the dipole formation at the interface of two oxides. A model to explain the driving force to form the dipole is discussed by taking account of the areal density difference of oxygen atoms at the interface, which should be a guideline to predict both the direction and magnitude of the interface dipoles. Based on this model the requirement for the oxides to form the dipoles is also discussed.

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1. Hobbs, C. C., Fonseca, L., Knizhnik, A., Dhandapani, V., Samavedam, S.B., Taylor, W.J., Grant, J.M., Dip, L. G.. Triyoso, D. H., Hedge, R. I., Gilmer, D. C., Garcia, R., Roan, D., Lovejoy, M. L., Rai, R. S., Hebert, E. A., Tseng, H. H., Anderson, S. G. H., White, B. E., and Tobin, P. J., IEEE Trans. Electron Dev. 51, 971 (2004).
2. Yamamoto, Y., Kita, K., Kyuno, K. and Toriumi, A., Jpn. J. Appl. Phys. Pt.1, 46, 7251 (2007).
3. Iwamoto, K., Kamimuta, Y., Ogawa, A., Watanabe, Y., Migita, S., Mizubayashi, W., Morita, Y., Takahashi, M., Ota, H., Nabatame, T., and Toriumi, A., Appl. Phys. Lett. 92, 132907 (2008).
4. Kamimuta, Y., Iwamoto, K., Nunoshige, Y., Hirano, A., Mizubayashi, W., Watanabe, Y., Migita, S., Ogawa, A., Ota, H., Nabatame, T., and Toriumi, A., Tech. Dig. Int. Electron Dev. Meet. 2007, pp.341344.
5. Kirsch, P. D., Sivasubramani, P., Huang, J., Young, C. D., Quevedo-Lopez, M. A., Wen, H. C., Alshareef, H., Choi, K., Park, C. S., Freeman, K., Hussain, M. M., Bersuker, G., Harris, H. R., Majhi, P., Choi, R., Lysaght, P., Lee, B. H., Tseng, H. H., Jammy, R., Boscke, T. S., Lichtenwalner, D. J., Jur, J. S., and Kingon, A. I., Appl. Phys. Lett. 92, 092901 (2008).
6. Kubicek, S., Schram, T., Paraschiv, V., Vos, R., Demand, M., Adelmann, C., Witters, T., Nyns, L., Ragnarsson, L. A., Yu, H., Veloso, A., Singanamalla, R., Kauerauf, T., Rohr, E., Brus, S., Vrancken, C., Chang, V. S., Mitsuhashi, R., Akheyar, A., Cho, H. J., Hooker, J. C., O’sullivan, B. J., Chiarella, T., Kerner, C., Delabie, A., Van Elshocht, S., DeMeyer, K., De Gent, S., Absil, P., Hoffmann, T. and Biesemans, S., Tech. Dig. Int. Electron Dev. Meet. 2007, p.49.
7. Kirsch, P. D., Quevedo-Lopez, M. A., Krishnan, S.A., Krug, C., Alshareef, H., Park, C. S., Harris, R., Moumen, N., Neugroschel, A., Bersuker, G., Lee, B. H., Wang, J. G., Pant, G., Gnade, B. E., Kim, M. J., Wallace, R. M., Jur, J. S., Lidhtenwalner, D. J., Kingon, A. I., and Jammy, R., Tech. Dig. Int. Electron Dev. Meet. 2006, pp.629632.
8. Mise, N., Morooka, T., Emori, T., Kamiyama, S., Murayama, K., Sato, M., Ono, T., Nara, Y., and Ohji, Y., Tech. Dig. Int. Electon Dev. Meet. 2007, pp.527530.
9. Fulton, C. C., Lucovsky, G., and Nemanich, R. J., J. Appl. Phys. 99, 063708 (2006).
10. Toyoda, S., Kamada, H., Tanimura, T., Kumigashira, H., and Oshima, M., Ohtsuka, T., Hata, Y., and Niwa, M., Appl. Phys. Lett. 96, 0429 (2010).
11. Kakushima, K., Okamoto, K., Tachi, K., Song, J., Sato, S., Kawanago, T., Tsutsui, K., Sugii, N., Ahmet, P., Hattori, T., and Iwai, H., J. Appl. Phys. 104, 104908 (2008).
12. Zhu, L. Q., Kita, K., Nishimura, T., Nagashio, K., Wang, S. K., and Toriumi, A., Appl. Phys. Express 3, 061501 (2010).
13. Widiez, J., Nishiumura, T., Kita, K., and Toriumi, A., Jpn. J. Appl. Phys. 47, 2410 (2008).
14. Sharia, O., Demkov, A. A., Bersuker, G., and Lee, B. H., Phys. Rev. B 75, 035306 (2007).
15. Lin, L. and Robertson, J., Microelectronic Eng. 86, 1743 (2009).
16. Jagannathan, H., Narayanan, V., and Brown, S., ECS Trans. 16 (5) 19 (2008).
17. Sanderson, R. T., Science 114, 670 (1951).
18. Wang, X., Han, K., Wang, W., Chen, S., Ma, X., Chen, D., Zhang, J., Du, J., Xiong, Y., and Huang, A., Appl. Phys. Lett. 96, 152907 (2010).
19. Heine, V., Phys. Rev. 138, A1689 (1965).
20. Kita, K. and Toriumi, A., Appl. Phys. Lett. 94, 132902 (2009).
21. Hikita, Y., Nishikawa, M., Yajima, T. and Hwang, H.Y., Phys. Rev. B, 79, 073101 (2009).
22. Burton, J. D. and Tsymbal, E. Y., Phys. Rev. B, 82, 161407 (2010).

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Study on Dipole Layer Formation between Two Oxides : Experimental Evidences and Possible Models

  • Koji Kita (a1) and Akira Toriumi (a1)

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