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Study of The Origin of The Magnetic Anisotropy in RF Sequential Co-Sputitered Co100-XBX and Co74Fe6B20 Thin Films

Published online by Cambridge University Press:  25 February 2011

D. Y. Kim  and
R. M. Walser
D. Y. Kim
Affiliation:
University of Texas, Electrical and Computer Engineering Dept., Austin, Texas 78712
R. M. Walser
Affiliation:
University of Texas, Electrical and Computer Engineering Dept., Austin, Texas 78712
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Abstract

We prepared thin, amorphous, compositionally modulated films (CMF) by RF sequential co-sputtering with Co, B, and Fe targets. In principle this technique can produce controlled, small (<15 Å) scale modulations in composition. The in-plane anisotropies and coercivities of the CMF were more than one magnitude larger than those of typical thin, homogeneous, amorphous, alloy films (AF). The increase in anisotropy was growth induced and could be reduced by annealing to values comparable to those of amorphous AF. The coercivity, however, could not be significantly decreased by annealing, except in CMvF with the highest boron concentration. The stability of the coercivity might, therefore, be an observable consequence of the small scale composition heterogeneity.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 58 , 1985 , 173
Copyright
Copyright © Materials Research Society 1986

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References

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