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Structural Characterization and Crystallization Process of Nanostructured Silicon Thin Films Produced in Low-Pressure Silane Plasma

Published online by Cambridge University Press:  10 February 2011

G. Viera ,
Proca i Cabarrocas ,
J. Costa ,
S. Martínez  and
E. Bertran
G. Viera
Affiliation:
Dep. Física Aplicada i Òptica, Universitat de Barcelona. Avgda. Diagonal, 647, E08028 Barcelona, Spain
Proca i Cabarrocas
Affiliation:
Laboratoire de Physique des Interfaces et des Couches Minces. (CNRS, UPR 258), Ecole Polytechnique, F91128 Palaiseau, France
J. Costa
Affiliation:
Grup de Recerca en Materials. Dept. d'Enginyeria Industrial. Universitat de Girona Avgda. Lluis Santaló s/n E17071 Girona, Spain
S. Martínez
Affiliation:
Dep. Cristal.lografia, Mineralogia i Dipòsits Minerals, Universitat de Barcelona. Avgda. Diagonal 647, E08028 Barcelona, Spain
E. Bertran
Affiliation:
Dep. Física Aplicada i Òptica, Universitat de Barcelona. Avgda. Diagonal, 647, E08028 Barcelona, Spain
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Abstract

Nanostructured silicon thin films (ns-Si:H), consisting of a two-phase mixture of amorphous and ordered material, were obtained by plasma-enhanced chemical vapor deposition (PECVD) under a wide range of plasma conditions. The key to embedding Si-ordered particles in the amorphous Si matrix was the formation of silicon clusters in the gas phase (diameter < 2nm) under conditions of plasma polymerization, and their incorporation into the growing films. The crystallization induced by thermal annealing in these nanostructured films can be attained faster than in conventional a-Si:H thin films, because the silicon-ordered particles cause a heterogeneous nucleation process in which they act as seeds for crystallization. In this work, we present a detailed structural characterization by using electron and X-ray diffraction patterns and Raman spectroscopy. The crystallization dynamics were studied in-situ by Raman spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 507: Symposium A – Amorphous & Microcrystalline Silicon Technology 1998 , 1998 , 933
Copyright
Copyright © Materials Research Society 1998

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References

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