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Structural and Microwave Characterization of Magnetron Sputtered Ba0.5Sr0.5TiO3 Films on c-plane Sapphire Substrates

  • Ernest Anthony Fardin (a1), A. S. Holland (a2), K. Ghorbani (a3) and B. F. Usher (a4)

Abstract

Many studies of Barium Strontium Titanate (BST) thin films for RF / microwave applications have employed MgO, LaAlO3 or Pt/Si as the substrate material for BST deposition. However, there have been relatively few reports of BST films grown on sapphire, despite the excellent microwave properties of this material. In this investigation, BST thin films were deposited by RF magnetron sputtering on (001) single crystal c-plane sapphire substrates. Interdigitated capacitors (IDCs) patterned on the film surface were used to measure the dielectric tunability and loss tangent at microwave frequencies. Thick Au conductors were electroplated to minimize conductor losses. Post deposition annealing in air was found to significantly improve the tunability of the sputtered films.

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