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Structural and Electronic Studies of C60 Films Deposited Using a New Technique of Neutral Cluster Beam Deposition

  • Zhong-Min Ren (a1), Zhi-Feng Ying (a1), Xia-Xing Xiong (a1), Mao-Qi He (a1), Yuan-Cheng Du (a1), Yu-Fen Li (a1) and Fu-Ming Li (a1)...

Abstract

C50 films, are deposited on Si(111) substrates using neutral cluster beams of fullerenes generated from a crucible with a special nozzle. X-ray diffraction (XRD) have been used to investigate the structural properties of C50 films, which indicate highly textural films as close-packed structure with strong (110) XRD assignment and 400Å for correlation length. Raman spectrum indicates the existence of stable C60 films. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) measurements are carried out to analyze the electronic properties of the films. The resistivity to contamination of C50 film deposited here is better than that deposited by MBE. Different kinds of oxygen contamination on the surfaces of C50 films and HDPG are detected by the results of O 1s XPS analyses.

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