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Sputter Deposition and Thermally Induced Phase Transformation of Non-BCC Chromium Thin Films

Published online by Cambridge University Press:  21 February 2011

M. J. O'Keefe
Affiliation:
Solid State Electronics Directorate, Wright-Patterson AFB, OH 45433-6543
S. Horiuchi
Affiliation:
Nippon Mining Co. LTD, Tokyo 105, Japan
J.J. Chu
Affiliation:
University of Illinois, Dept. of Materials Science and Engineering, Urbana, IL 61801
J.J. Rigsbee
Affiliation:
University of Illinois, Dept. of Materials Science and Engineering, Urbana, IL 61801
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Abstract

The crystal structure of sputter deposited chromium thin films on Coming 7059 glass, polytetrafluoroethylene, and cold rolled (110) oriented low carbon steel α-Fe substrates was investigated as a function of O and C incorporation into the growing Cr film. The as-deposited crystal structure of the films was found by X-ray diffraction to be either highly oriented (110) BCC α-Cr or (200) oriented A-15 δ-Cr. Chemical analysis of the films by Auger electron spectroscopy determined that the δ-Cr phaseformed when the combined O and C impurity concentration in the film was ∼15-30 at.%. At total impurity concentrations above ∼30 at.% or below ∼10 at.% standard BCC α-Cr formed. The crystal structure of the films was not influenced by the substrate material. X-ray photoelectron spectroscopy of the Cr 2pl/2-2p3/2 orbitals indicated that the dominate binding state of both the BCC α-Cr and A-15 δ-Cr films was characteristic of elemental Cr. Vacuum annealing of the A-15 δ-Cr films at 500º for one hour transformed the crystal structure into BCC α-Cr without a measurable change in chemical composition. The incorporation of O and C into the growing Cr film is believed to impurity stabilize the A-15 structure and favor its formation over the BCC structure.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

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