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A Simple Model for Stress Voiding in Passivated Thin Film Conductors

  • J. R. Lloyd (a1) and E. Arzt (a2)


A model is proposed for stress voiding in passivated thin film conductors. The rate limiting step is argued to be the formation of vacancies at dislocation jogs which then diffuse to void sites.



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1) Klema, J., Pyle, R. and Domangue, E., Proc. 22nd Ann. Int'l. Reliab. Phys. Symp., IEEE, 1 (1984)
2) Curry, J., Fitzgibbon, G., Guan, Y., Muollo, R., Nelson, G. and Thomas, A., 22nd Int'l Reliab. Phys. Symp. IEEE, 6 (1984)
3) Yue, J.T., Funsten, W.P. and Taylor, R.V., Proc. 23rd Ann. Int'l. Reliab. Phys. Symp. IEEE 4 (1985)
4) Turner, T. and Wendel, K., Proc. 23rd Ann. Int'l Reliab.Phys. Symp. IEEE, 142 (1985)
5) Hinode, K., Owada, N., Nishida, T. and Mukai, K., J. Vac. Sci. Technol. B5, 518 (1987)
6) McPherson, J.W. and Dunn, C.F., J. Vac. Sci. Technol. B5, 1321 (1987)
7) Yost, F.G., Romig, A.D. Jr. and Bourcier, R.J., Sandia Report SAND88–0946, Sandia National Laboratories (1988) and F.G. Yost, D.E. Amos and A.D. Romig, Proc. 27th Ann. Int'l. Reliab. Phys. Smp. IEEE, 193 (1989)
8) Flinn, P.A. and Chiang, C., J. Appl. Phys, 67, 2927 (1990)
9) Arzt, E. and Nix, W. D, to be published in Met. Trans. (1992)
10 Kaneko, H., Hasanuma, M., Sawabe, A., Kawanoue, T., Kohanawa, Y., Komatsu, S. and Miyachi, M., Proc. 28th Ann. Int'l Reliab. Phys. Symp. IEEE, 194 (1990)
11) Tanikawa, A., Okabayashi, H., Morii, H. and Fujita, H., Proc. 28th Ann. Int'l. Reliab. Phys. Symp., 209 (1990)
12) Pramanik, D. and Jain, V., Proceedings SPIE Vol.1596, 132 (1991)


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