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Simple Fabrication of High Density Quantum Dot Arrays Using Anodic Aluminum Oxide Mask

Published online by Cambridge University Press:  21 March 2011

Joon-Ho Sung
Affiliation:
Department of Chemistry and School of Molecular Science - BK21, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Korea
Heesung Moon
Affiliation:
Department of Chemistry and School of Molecular Science - BK21, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Korea
Jae Ho Bahng
Affiliation:
Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, Korea
Ja-Yong Koo
Affiliation:
Korea Research Institute of Standards and Science (KRISS), Daejeon 305-340, Korea
Bongsoo Kim
Affiliation:
Department of Chemistry and School of Molecular Science - BK21, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Korea
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Abstract

We fabricated quantum dot arrays using anodic alumina mask. We grew an alumina template on Si wafers by two-step anodization. The porous alumina template thus grown is used as a mask for metal deposition. After thermal evaporation and removal of the mask, we fabricated the quantum dot arrarys on a Si substrate. Using this template-assisted method we obtained a high density array of quantum dots in a large scale. These quantum dots have a narrow size distribution which can be easily controlled by a pore widening of templates from 20 to 60 nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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