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Silicon Surface Chemistry By IR Spectroscopy in the Mid- To Far-IR Region: H2O And Ethanol On Si(100)

  • L. M. Struck (a1) (a2) (a3), J. Eng (a1), B. E. Bent (a1), Y. J. Chabal (a2), G. P. Williams (a4), A. E. White (a2), S. Christman (a2), E. E. Chaban (a2), K. Raghavachari (a2), G. W. Flynn (a1), K. Radermacher (a5) and S. Mantl (a5)...

Abstract

The technique of external reflection infrared (IR) spectroscopy is used to study silicon surface chemistry. External reflection is enhanced by implanting a buried cobalt silicide layer in silicon to act as an infrared reflector. The preparation of clean well-ordered surfaces from the ion implanted substrates is demonstrated. The reactions of water and ethanol with Si(100) are investigated.

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