Here we present a novel silicon nanopore planar patch clamp chip for single ion channel screening. We fabricate our devices using a combination of KOH and metal-assisted etching. Electrical characterization shows that the shunt capacitance and access resistance are within the accepted ranges for single channel recordings. In order to test our devices, we cultured and differentiated human neuroblastoma SH-SY5Y cells on chip. We reliably obtained a high resistance seal to the cell membrane and report single ion channel activity recordings.