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Silicon Carbide Die Attach Scheme for 500°C Operation

Published online by Cambridge University Press:  15 March 2011

Liang-Yu Chen
Affiliation:
AYT/NASA Glenn Research Center, Cleveland, OH 44135
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Abstract

Single crystal silicon carbide (SiC) has such excellent physical, chemical, and electronic properties that SiC based semiconductor electronics can operate at temperatures in excess of 600°C well beyond the high temperature limit for Si based semiconductor devices. SiC semiconductor devices have been demonstrated to be operable at temperatures as high as 600°C, but only in a probe-station environment partially because suitable packaging technology for high temperature (500°C and beyond) devices is still in development. One of the core technologies necessary for high temperature electronic packaging is semiconductor die-attach with low and stable electrical resistance. This paper discusses a low resistance die-attach method and the results of testing carried out at both room temperature and 500°C in air. A 1 mm2 SiC Schottky diode die was attached to aluminum nitride (AlN) and 96% pure alumina ceramic substrates using precious metal based thick-film material. The attached test die using this scheme survived both electronically and mechanically performance and stability tests at 500°C in oxidizing environment of air for 550 hours. The upper limit of electrical resistance of the die-attach interface estimated by forward I-V curves of an attached diode before and during heat treatment indicated stable and low attach-resistance at both room-temperature and 500°C over the entire 550 hours test period. The future durability tests are also discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

REFERENCES

1. Hunter, G.W., Neudeck, P.G., Fralick, G.C. et al. , SiC-Based Gas Sensors Development, Proceedings of International Conference on SiC and Related Materials. Raleigh, North Carolina, Oct. 10-15, 1999.Google Scholar
2. Neudeck, Philip G., Beheim, Glenn M., and Salupo, Carl, 600 °C Logic Gates Using Silicon Carbide JFET's, 2000 Government Microcircuit Applications Conference, March 20-23, Anaheim, CA. An earlier review article: Robert F. Davis, Galina Kelner, Michael Shur, John W. Palmour, and John A. Edmond, Thin Film Deposition and Microelectronic and Optoelectronic Device Fabrication and Characyterization in Monocrystalline Alpha and Beta Silicon Carbide, Special Issue on Large Bandgap Electronic Materials and Components, Proceedings of the IEEE, Vol.79, 5, 1991.Google Scholar
3. Salmon, Jay S., Johnson, R. Wayne, and Palmer, Mike, Thick Film Hybrid Packaging Techniques for 500 °C Operation, Transactions of Fourth International High Temperature Electronics Conference (HiTEC), June 15-19, 1998, Albuquerque, New Mexico USA.Google Scholar
4. Chen, Liang-Yu, Hunter, Gary W., and Neudeck, Philip G., Thin and Thick Film Materials Based Interconnection Technology for 500 °C Operation, Transaction of First International AVS Conference on Microelectronics and Interfaces, Santa Clara, CA, Feb. 7-11, 2000.Google Scholar
5. Keusseyan, R.L., Parr, R., Speck, B.S., Crunpton, J.C., Chaplinsky, J.T., Roach, C.J., Valena, K., and Horne, G.S., New Gold Thick Film Compositions for Fine Line Printing on Various Substrate Surfaces, 1996 ISHM Symposium.Google Scholar
6. Okojie, Robert S., Ned, Alexander A., Kurtz, Anthony D., and Carr, William N., Electrical Characterization of Annealed Ti/TiN/Pt Contacts on N-type 6H-SiC Epilayer, IEEE Transactions on Electron Devices, Vol. 46, 2, 1999.Google Scholar