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Self-Aligned Suicides for ULSI

  • Karen Maex (a1) and Rob Schreutelkamp (a1)

Abstract

Since self-aligned suicides are beginning to be used routinely in integral ULSI processes, critical processing characteristics need to be investigated. In this paper, three relevant issues concerning processing are discussed, namely, the formation of ultra-thin suicides, the silicidation of laterally confined areas and the thermal stability of silicide/Si structures. The technological aspects of TiSi2 and COSi2 are discussed and related to their materials properties.

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[1] Maex, Karen, Appl. Surf. Sci. 53, 328 (1991).
[2] Maex, K., De Keersmaecker, R. F., Ghosh, G., Delaey, L., and Probst, V., J. Appl. Phys. 66, 5327 (1989).
[3] Probst, V., Schaber, H., Mitwalsky, A., Kabza, H., Hofmann, B., Maex, K. and Van den hove, L., J. Appl. Phys. 70, 693 (1991).
[4] Beyers, R., Coulman, B. and Merchant, P., J. Appl. Phys. 61, 5110 (1987).
[5] Mann, R. W., Racine, C. A., and Bass, R. S., Mat. Res. Soc. Symp. Proc. 224, 115 (1991).
[6] Nemanich, R. J., Jeon, H., Sukow, C. A., Honeycutt, J. W., and Rozgonyi, G. A., these proceedings.
[7] Vandenabeele, P., Schreutelkamp, R. J., Maex, K., Vermeiren, C., and Coppye, W., these proceedings.
[8] Schreutelkamp, R. J., Vandenabeele, P., Deweerdt, B., Coppye, W., Vermeiren, C., Lauwers, A., and Maex, K., these proceedings.
[9] Norström, H., Maex, K. and Vandenabeele, P., Mat. Res. Soc. Symp. Proc. 182, 71(1990).
[10] Norström, H., Maex, K., Romano-Rodriguez, A., Vanhellemont, J. and Van den hove, L., Micro-Electronic Engineering 14, 327 (1991).
[11] Lithomap, Trademark of Prometrix Corp., 3255 Scott Blvd., Bldg. 6, Santa Clara, CA 95054, USA.
[12] Norström, H., Maex, K. and Vandenabeele, P., Thin Solid Films, 198, 53 (1991).
[13] Schreutelkamp, R. J., Deweerdt, B., Verbeeck, R. and Maex, K., European Solid State Device and Research Conference (ESSDERC), Leuven, Belgium, Sept. 1992, to be published in the proceedings.

Self-Aligned Suicides for ULSI

  • Karen Maex (a1) and Rob Schreutelkamp (a1)

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