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Selection and Design of Precursors for the MOCVD of Lead Scandium Tantalate

  • A.C Jones (a1), H.O. Davies (a1), T.J. Leedham (a1), M.J. Crosbie (a2), P.J. Wright (a2), P.O'. Brien (a3) and K.A. Fleeting (a3)...

Abstract

Metalorganic chemical vapour deposition (MOCVD) is a promising technique for the deposition of the pyroelectric oxide lead scandium tantalate, Pb(Sc0.5Ta0.5)O3. In order to exploit the full potential of the method, it is important to identify the optimum combination of precursors so that process parameters and film properties are optimised. In this paper, the molecular design of new, more compatible Ta and Sc oxide precursors is described and it is shown how the use of carefully matched precursors allows the growth of Pb(Sc0.5Ta0.5)O3 in the required perovskite phase at low substrate temperatures.

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Selection and Design of Precursors for the MOCVD of Lead Scandium Tantalate

  • A.C Jones (a1), H.O. Davies (a1), T.J. Leedham (a1), M.J. Crosbie (a2), P.J. Wright (a2), P.O'. Brien (a3) and K.A. Fleeting (a3)...

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