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Rotating Disk Reactor-Low Pressure Metal Organic Chemical Vapor Deposition (Mocvd) of Optical Films

  • John McAleese (a1), L. Gary Provost (a1), Gary S. Tompa (a1), Andrei Colibaba-Evulet (a2), Nick G. Gulmac (a2) and John J. Doyle (a3)...

Abstract

Over the past 30 years, the need for transparent conducting oxide coatings has been met almost exclusively by tin doped indium-oxide. As the display market advances in complexity, the demand for alternative transparent materials exhibiting high conductivity and stability has become greater. In this paper, we discuss briefly the merits of using doped ZnO as a superior transparent conducting oxide. We report here our results in scaling our ZnO MOCVD reactor technology from 5° to 12° diameter susceptors. Using Rotating Disk Reactor-Low Pressure Metal Organic Chemical Vapor Deposition, we have been able to obtain large area uniformity on multiple (14 cm × 9 cm) glass sheets per deposition run. Promising film characteristics suggest significant application in the field of flat panel displays and other optical systems may be possible.

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[3] Electronic Products, Feb., 28 (1996).
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Rotating Disk Reactor-Low Pressure Metal Organic Chemical Vapor Deposition (Mocvd) of Optical Films

  • John McAleese (a1), L. Gary Provost (a1), Gary S. Tompa (a1), Andrei Colibaba-Evulet (a2), Nick G. Gulmac (a2) and John J. Doyle (a3)...

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