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Room Temperature Fabrication of Micro-Crystalline Silicon Films for Tft's By Ecr Pecvd

  • Yoo-Chan Jeon (a1), Seok-Woon Lee (a1) and Seung-Ki Joo (a1)

Abstract

Microcrystalline silicon films were formed at room temperature without hydrogen dilution by ECR PECVD. Microwave power more than 400 W was necessary to get crystalline films and the crystallinity increased with the power thereafter. Addition of hydrogen and argon enhanced the crystalline phase formation and the deposition rate, the reason of which was found that hydrogen etched silicon films and argon addition drastically increased the etch rate. Annealing of the films showed that microcrystalline silicon films formed by ECR PECVD have a small fraction of amorphous phase. TFT's using silicon nitride and doped/undoped microcrystalline silicon films were fabricatedd with whole processes at room temperature.

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1. Iompson, M. I. et al. , IEEE rrans. Electron Dev., 29, 1643 (1982)
2. Mackenzie, K. D. et al. , Appl. Phys. A, 31, 87 (1983)
3. Chen, I., J. Appl. Phys., 50, 296 (1984)
4. Liu, C. I., Lee, K. H., Yu, C. H. D., Sung, J. J., Nagy, W. J., Kornblit, A., Kook, I., Olasupo, K. R., Druckemillerm, R. O., Fu, C. C., and Molloy, S. J., IEDM 92, 823 (1992)
5. Ikeda, S. et al. , IEDM 90, 469 (1990)
6. Mohri, M., Kakinuma, J., and Isuruoka, T., IEDM 92, 673 (1992)
7. Shimizu, K., Sukiura, O., and Matsumura, M., IEDM 92, 669 (1992)
8. Ilatalis, M. K., Kung, J., Kanicki, J., and Bright, A., MRS Proc., 182, 357 (1990)
9. Arai, H., Nakazawa, K., and Kohda, S., Appl. Phys. Lett., 46, 888 (1986)
10. Kanicki, J., Hasan, E., Kotecki, D. F., Takamori, T., and Griffith, J. H., MRS Proc., 149, 173 (1989)
11. rsai, C. C., Thompson, R., Donald, C., Ponce, F. A., Anderson, C. B., and Wacker, B., MRS Proc., 118, 49 (1988)
12. Drevillon, B., Solomon, I., and Fang, M, MRS Proc., 283, 659, (1993)
13. Ishihara, S., He, D., Akasaka, T., Ariki, Y., Nakata, M., and Shimizu, I., MRS Proc., 283, 489 (1993)
14. Jeon, Y. -C., Lee, H. -Y., and Joo, S. K., J. Electronic Mat., 21, 1119 (1992)
15. Bennett, H. E. and Bennett, J. M., in Physics of Thin Films., vol. 4, edited by Hass, C. and Thun, R. E. (Academic Press, London, 1984)
16. Habeke, G. and Jastrzebski, L., J. Electrochem. Soc., 137, 696 (1990)
17. Chapman, B., Glow Discharge Process (John Willy, New York, 1980)

Room Temperature Fabrication of Micro-Crystalline Silicon Films for Tft's By Ecr Pecvd

  • Yoo-Chan Jeon (a1), Seok-Woon Lee (a1) and Seung-Ki Joo (a1)

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