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The Role of Ion Beam Assisted Surface Chemistry in Etching: Adsorption and Reactions of ALKYL Halides

  • Duncan Marshall (a1) and Richard B. Jackman (a1)

Abstract

The form of ideal surface chemistry that is necessary for chemically assisted ion beam etching (CAIBE), with particular reference to in-situ processing is considered. Whilst to date CAIBE has been almost exclusively carried out with chlorine, distinct advantages exist if a compound that which displays spontaneous reactivity which is limited to one or two monolayers can be used. The role of alkyl halides in this scenario has been investigated through the use of surface spectroscopic probes to investigate the microscopic chemical and ion beam assisted reactivity that may be achieved. Dichloroethane has been found to display promising behaviour.

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1. Jackman, RB and Tyrrell, GC 8th Int. Conf. Ion Plasma Ass. Tech. (IPAT'92), 1992. p102
2. Komuro, M and Hiroshima, H J. Vac. Sci. Tech., B9 (1991), 2656
3. Kosugi, T, Gamo, K, Namba, S and Aihara, R J. Vac. Sci. Tech.. B9 (1991), 2660
4. Kosugi, T, Yamashiro, T, Aihara, R, Gamo, K and Namba, S J. Vac. Sci. Tech., B9 (1991), 3099
5. Wang, YL, Harriot, LR, Hamm, RA and Temkin, H Appl. Phys. Letts., 56 (1990), 749
6. Aoyagi, Y, Shinmura, K, Kawasaki, K, Tanaka, T, Gamo, K, Namba, S and Nakamoto, I Appl. Phys. Letts., 60 (1992), 968
7. Ehrlich, DJ and Nguyen, VT (Eds) “Emerging Technologies for in-situ processing” (Martinus Nijhoff, Dordrecht 1988)
8. Ameen, MS and Mayer, TM J. Appl. Phys., 63 (1988), 1152
11. Tyrrell, GC, Marshall, D, Beckman, J and Jackman, RB J. Phys.(Condens.Mat.), 3 (1991), S 179
12. Coburn, JW Sol. State Tech., 29 (1986), 117
13. McNevin, SC and Becker, GE J. Appl. Phys., 58 (1985), 4670
14. O'Brien, WL, PaaulsenBoaz, CM, Rhodin, TN and Rathbun, LC J Appl. Phys., 64 (1988), 6523
15. Jackman, RB, “Photochemical etching of III-V semiconductors” p.297 in “Photochemical processing of electronic materials” Eds. Boyd, IW and Jackman, RB (Academic, London 1992)
16. Stevenson, R Chem. Brit., 26 (1990), 731
17. Murrell, AJ, Wee, A, Fairbrother, DH, Singh, NK, Foord, JS, Davies, GJ and Andrews, DA J. Appl. Phys., 68 (1990), 4053
18. Schafer, B, Buck, M and Hess, P Infrared Phys., 25 (1985), 245
19. Jackman, RB, Price, RJ and Foord, JS Appl. Surf. Sci., 36 (1989), 296
20. Marshall, D and Jackman, RB Sub. to Vacuum (April 1992)

The Role of Ion Beam Assisted Surface Chemistry in Etching: Adsorption and Reactions of ALKYL Halides

  • Duncan Marshall (a1) and Richard B. Jackman (a1)

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