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Residual Stress, Mechanical Behavior and Electrical Properties of Cu/Nb Thin-Film Multilayers

Published online by Cambridge University Press:  15 February 2011

A. J. Griffin JR. ,
J. D. Embury ,
M. F. Hundley ,
T. R. Jervis ,
H. H. Kung ,
W. K. Scarborough ,
K. C. Walter ,
J. Wood  and
M. Nastasi
A. J. Griffin JR.
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
J. D. Embury
Affiliation:
McMaster University, Ontario, Canada
M. F. Hundley
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
T. R. Jervis
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
H. H. Kung
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
W. K. Scarborough
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
K. C. Walter
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
J. Wood
Affiliation:
McMaster University, Ontario, Canada
M. Nastasi
Affiliation:
Los Alamos National Laboratory, Los Alamos, NM 87545
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Abstract

The effect of compositional wavelength on the residual stress, electrical resistivities and mechanical properties of Cu/Nb thin-film multilayers sputtered onto single-crystal Si substrates was evaluated. Electrical resistivities were measured down to 4 °K using a standard four-point probe measurement system. A differential specimen-curvature technique was used to detennine residual stress, and a mechanical-properties microprobe was employed to obtain hardness and elastic modulus. Characterization techniques included profilometry, Ion-Beam Analysis (IBA) and Transmission Electron Microscopy (TEM). The hardness of the Cu-Nb multilayers increased with decreasing compositional wavelength so that the layered structures had hardness values in excess of either of the constituents and the hardness predicted by the rule of mixtures. A peak in the net residual compressive stress of the multilayers was observed at a compositional wavelength of 100 nm. No resistivity plateau was observed within the composition wavelength range studied.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 382: Symposium G – Structure and Properties of Multilayered Thin Films , 1995 , 309
Copyright
Copyright © Materials Research Society 1995

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References

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