Skip to main content Accessibility help
×
Home

Remote Plasma Enhanced-Metal Organic Chemical Vapor Deposition of Zirconium Oxide/Silicon Oxide Alloy, (ZrO2)1-(SiO2)1−x (x:≤0.5), Thin Films for Advanced High-K Gate Dielectrics

  • D. Wolfe (a1), K. Flock (a1), R. Therrien (a1), R. Johnson (a1), B. Rayner (a1), L. Günther (a1), N. Brown (a1), B. Claflin (a1) and G. Lucovsky (a1)...

Abstract

A remote plasma enhanced-metal organic chemical vapor deposition (RPE-MOCVD) process was developed for the preparation of non-crystalline (ZrO2)x-(SiO2)1−x (x ≤ 0.5) alloys, targeting the compound composition ZrSiO4with k ∼ 12.5. Shifts in Si LVV and Zr LMM AES energies with respect to elemental values showed that the deposited film was a fully-oxidized zirconium/silicon alloy. FTIR results were consistent with AES, and a Zr-O-Si bonding mode was identified in the spectra. The films were amorphous before and after RTA at 900°C for 30 sec, as monitored via RHEED. Optical absorption measurements indicated the onset of band-to-band transitions at an energy of approximately 6 eV. Finally, C-V testing showed that the films were insulating.

Copyright

References

Hide All
[1] Blumenthal, W.B., The Chemical Behavior of Zirconium, (Van Nostrand, New York, 1958), 214.
[2] Bragg, L., Claringbull, G.F., and Taylor, W.H., Crystal Structures of Minerals, (Cornell Press, Ithaca, 1937), 185.
[3] Martin, R.M., Lucovsky, G., and Helliwell, K., Phys. Rev. B. 13, 1383 (1976).10.1103/PhysRevB.13.1383
[4] Hückel, W., Structural Chemistry of Inorganic Compounds, (Elsevier, Amsterdam, 1951).
[5] Coudurier, L., Hopkins, D.W., and Wilkomirsky, I., Fundamentals of Metallurgical Processes, 2nd ed., (Pergamon Press, Oxford, 1985).
[6] Hubbard, K.J. and Schlom, D.G., J. Mater. Res. 11, 2757 (1996).10.1557/JMR.1996.0350
[7] Lucovsky, G., Tsu, D.V., Rudder, R.A., and Markunas, R.J., in Thin film Processes II, edited by Vossen, J.L. and Kern, W. (Academic Press Inc., San Diego, 1991), pp. 565619.10.1016/B978-0-08-052421-4.50016-2
[8] Handbook of Auger Electron Spectroscopy 3rd ed., edited by Hedberg, C.L. (Physical Electronics, Inc., Eden Prarie, MN, 1995).
[9] Tsu, D.V., Lucovsky, G., and Davidson, B.N., Phys. Rev. B 40, 1795 (1989).10.1103/PhysRevB.40.1795
[10] Tartaj, P., Serna, C.J., Moya, J.S., Requena, J., Ocana, M., DeAza, S., and Guitian, F., J. Mater. Sci. 31, 6089 (1996).10.1007/BF01152164
[11] Duffy, J.A., Bonding, Energy Levels and Bands in Inorganic Solids, (Wiley, New York, 1990).

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed