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Refinement of Plas Samples by Using Afm Image and First Observation of Plas Signals on Amorphous Carbon Nitridea-CNx Films

Published online by Cambridge University Press:  10 February 2011

H. Furukawa ,
S. Nitta ,
M. Hioki ,
T. Iwasaki ,
T. Itoh  and
S. Nonomura
H. Furukawa
Affiliation:
Department of Electrical Engineering, Gifu University, 1-1 Yanaido, Gifu, 501-11, JAPAN
S. Nitta
Affiliation:
Department of Electrical Engineering, Gifu University, 1-1 Yanaido, Gifu, 501-11, JAPAN
M. Hioki
Affiliation:
Department of Electrical Engineering, Gifu University, 1-1 Yanaido, Gifu, 501-11, JAPAN
T. Iwasaki
Affiliation:
Department of Electrical Engineering, Gifu University, 1-1 Yanaido, Gifu, 501-11, JAPAN
T. Itoh
Affiliation:
Department of Electrical Engineering, Gifu University, 1-1 Yanaido, Gifu, 501-11, JAPAN
S. Nonomura
Affiliation:
Department of Electrical Engineering, Gifu University, 1-1 Yanaido, Gifu, 501-11, JAPAN
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Abstract

The shape of several waveguide end of samples for photoluminescence absorption spectroscopy (PLAS) was studied by atomic force microscope (AFM), because there was an experimental problem where some samples for PLAS did not work. Using the result of AFM, the waveguide end was reshaped by plasma dry etching. The shortening of the etching time was an effective method to improve the structure of the waveguide end. Secondly, the PLAS method was extended to the other materials from a-Si:H. The PLAS signal of amorphous carbon nitride a-CNx was detected for the first time. Amorphous carbon nitride a-CNx film itself and the interface between a-CNx and a-Si02 are found as good as a-Si:H and the interface between a-Si:H and a-Si 3N4+x:H, respectively.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 507: Symposium A – Amorphous & Microcrystalline Silicon Technology 1998 , 1998 , 465
Copyright
Copyright © Materials Research Society 1998

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References

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