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Recent Progress in the Growth of Mid-ir Emitters by Metalorganic Chemical Vapor Deposition

  • R. M. Biefeld (a1), A. A. Allerman (a1), S. R. Kurtz (a1) and K. C. Baucom (a1)

Abstract

We report on recent progress and improvements in the metal-organic chemical vapor deposition (MOCVD) growth of mid-infrared lasers and using a high speed rotating disk reactor (RDR). The devices contain AlAsSb claddings and strained InAsSb active regions. These lasers have multi-stage, type I InAsSb/InAsP quantum well active regions. A semi-metal GaAsSb/InAs layer acts as an internal electron source for the multi-stage injection lasers and AlAsSb is an electron confinement layer. These structures are the first MOCVD multi-stage devices. Growth in an RDR was necessary to avoid the previously observed Al memory effects found in conventional horizontal reactors. A single stage, optically pumped laser yielded improved power (> 650 mW/facet) at 80 K and 3.8 μm. A multi-stage 3.8–3.9 μm laser structure operated up to T=170 K. At 80 K, peak power > 100 mW and a high slope-efficiency were observed in gain guided lasers.

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Recent Progress in the Growth of Mid-ir Emitters by Metalorganic Chemical Vapor Deposition

  • R. M. Biefeld (a1), A. A. Allerman (a1), S. R. Kurtz (a1) and K. C. Baucom (a1)

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