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Reactive Scattering of Si2 H6 from the Si(100) Surface

Published online by Cambridge University Press:  22 February 2011

D. A. Hansen
Affiliation:
School of Chemical Engineering, Cornell University, Ithaca, NY 14853USA
M. J. Furjanic
Affiliation:
School of Chemical Engineering, Cornell University, Ithaca, NY 14853USA
L.-Q. Xia
Affiliation:
School of Chemical Engineering, Cornell University, Ithaca, NY 14853USA
J. R. Engstrom*
Affiliation:
School of Chemical Engineering, Cornell University, Ithaca, NY 14853USA
*
Address correspondence to this author.
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Abstract

The reaction of Si2H6 with the Si(100) surface has been examined via supersonic molecular beam scattering techniques. The effects of incident translational energy, incident angle, mean vibrational energy and surface temperature have been considered explicitly. It is found that the reaction probability is most sensitive tothe incident translational energy, varying nearly linearly with increasing energy. The effect of incident angle θi can be accounted for by an energy scaling law that is given approximately by <Etr>cosnθi, where n ∼ 1.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

1. Jasinski, J. M and Gates, S. M., Acc. Chem. Res. 24, 9 (1991).Google Scholar
2. Hirayama, H., Tatsumi, T. and Aizaki, N., Appl. Phys. Lett. 52, 2242 (1988).Google Scholar
3. Scott, B. A., Estes, R. D. and Jasinski, J. M., J. Chem. Phys. 89, 2544 (1988).Google Scholar
4. Gates, S. M., Surface Sci. 195, 307 (1988).Google Scholar
5. Xia, L.-Q., Hansen, D. A., Furjanic, M. J. and Engstrom, J. R. (in preparation).Google Scholar
6. Ishizaka, A. and Shiraki, Y., J. Electrochem. Soc. 133, 666 (1986).Google Scholar
7. King, D. A. and Wells, M. G., Surface Sci. 29, 454 (1971).Google Scholar
8. Höfer, U., Li, L. and Heinz, T. F., Phys. Rev. B 45, 9485 (1992).Google Scholar
9. Engstrom, J. R., Hansen, D. A., Xia, L.-Q. and Furjanic, M. J. (in preparation).Google Scholar