Skip to main content Accessibility help

Rbs Analysis of Intermixing in Annealed Samples of Pt/Ti/Iii-V Semiconductors

  • W. Savin (a1), B. E. Weir (a2), A. Katz (a2), S. N. G. Chu (a2), S. Nakahara (a2) and D. W. Harris (a3)...


Low resistance Pt/Ti nonalloy contacts to GaAs, GaP, In As, InGaAs, and In Alas have been studied using Rutherford Backscattering. The samples were studied by comparing an as deposited structure to samples annealed at temperatures between 300°C and 600°C for 30 s. For all samples intermixing of the Pt and Ti was observed to start at 350°C. The Ti/HI-V semiconductor interface mixing was strongest for As when it was present, but In and Ga also strongly intermixed for anneals of 4S0°C and above.



Hide All
1. Katz, A.. Thomas, P. M., Chu, S. N. G., Lee, J. W. and Dautremont-Smith, W. C., J. Appl. Phys. 66, 2056 (1989).
2. Bahir, G., Mem, J. L., Abelson, J. R. and Sigmon, T. W., J. Electronic Mat 16.257 (1987).
3. Thomas, P. M., Dautremont-Smith, W. C., Lopata, J., Appelbaum, A. and Brown, R. L., Private Communication.
4. Cheng, C. C., Sheng, T. T., McCoy, R. J., Nakahara, S., Keramidas, V. G. and Kermanis, F., J. Appl. Phys. 50, 7032 (1979).
5. Vandenberg, J. M., Tetnkin, H.. Hamm, R. A. and Digiuseppe, M. A., J. Appl. Phys. 53,7385. (1982).
6. Camlibel, I., Chin, A. K., Ermanis, F., Digiuseppe, M. A., Lourenco, J. A. and Bonner, W. A., J. Electrochem. Soc. 11,2585(1982).
7. Katz, A., Weir, B. E., Chu, S. N. G., Thomas, P. M., Soler, M., Boone, T. and Dautremont-Smith, W. C., Appl. Phys. Lett, to be published.
8. Katz, A., Dautremont-Smith, W. C., Thomas, P. M., Koszi, L. A., Lee, J. W., Riggs, V. G., Brown, R. L., Zilko, J. L. and Lahav, A., J. Appl. Phys. 65,4319 (1989).
9. Goodwin, A. R., Davies, I. G. A., Ribb, R. M. and Murphy, K. H., J. Lightwave Tech. 6,1424 (1989).
10. Katz, A., Thomas, P. M., Chu, S. N. G., Dautremont-Smith, W. C., Sobers, R. G. and Napholtz, S. G., J. Appl. Phys., 67,884 (1990).
11. Katz, A., Dautremont-Smith, W. C., Chu, S. N. G., Thomas, P. M., Koszi, L. H., Lee, J. W., Riggs, V. G.. Brown, R. L., Napholtz, S. G., Zilko, J. L. and Lahau, A., Appl. Phys. Lett. 54,2306 (1989).
12. Kate, A.. Weir, B. E., Maher, D., Thomas, P. M., Dautremont-Smith, W. C.. Kimerling, L. C., Karlickek, R. F. Jr. and Wynn, J. D.. Appl. Phys. Lett. 55.2220 (1989).
13. Doolittle, L. R.. Vacl. Instr. ??? Meth. B9,344 (1985).
14. Katz, A., Dautremont-Smith, W. C., Thomas, P. M., Koszi, L. A., Lee, J. W., Riggs, V. G., Brown, R. L., Zilko, J. L.. J. Appl. Phys. 65(11). 4319 (1989).
15. Simha, A. K., Smith, T. E.. Read, M. H. and Poate, J. M.. Solid-State Electron. 19.409 (1976).
16. Katz, A., Nakahara, S., Savin, W. and Weir, B., Submitted to J. Appl. Phys.
Recommend this journal

Email your librarian or administrator to recommend adding this journal to your organisation's collection.

MRS Online Proceedings Library (OPL)
  • ISSN: -
  • EISSN: 1946-4274
  • URL: /core/journals/mrs-online-proceedings-library-archive
Please enter your name
Please enter a valid email address
Who would you like to send this to? *


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed