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Purposeful Chemical Design of Mocvd Precursors for Silicon-Based Systems

Published online by Cambridge University Press:  25 February 2011

Bernard J. Aylett
Bernard J. Aylett*
Affiliation:
Department of Chemistry, Queen Mary College, London El 4NS, U.K.
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Abstract

It is shown that volatile molecular compounds with silicon-metal bonds can act as effective MOCVD precursors to metal silicides, which aredeposited as thin films under relatively mild conditions. Strategies for the design and synthesis of such “prevenient” precursors are explored, and possible extensions of this approach are considered.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 131: Symposium E – Chemical Perspectives of Microelectronic Materials I , 1988 , 383
Copyright
Copyright © Materials Research Society 1989

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References

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