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The Progress of Plasma Anodization and its Applications

  • Li Qiong (a1) and Xu Jingfang (a1)

Abstract

RF stimulated DC discharge mode was developed and used in plasma anodization. Equipment operating in this mode has been set up for anodizing semiconductor materials. To improve the feature of this equipment, enhanced electrode was induced. Anodized oxide film of silicon was applied as gate oxide film in MOSFETs on SOI structure. This paper describes this discharge mode and enhanced electrode and give the properties of the oxide film and MOSFETs.

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The Progress of Plasma Anodization and its Applications

  • Li Qiong (a1) and Xu Jingfang (a1)

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