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Processing of Dense Nanocrystalline Zirconia Thin Films by Sol-Gel

  • Christoph Peters (a1), Matthias Bockmeyer (a2), Reinhard Krüger (a3), André Weber (a4) and Ellen Ivers-Tiffée (a5)...

Abstract

Via metal organic deposition (MOD) sapphire substrates were multiple dip-coated with a molecular dispersive 8 mol% Y2O3 doped ZrO2 (8YSZ) sol to prepare dense, crack-free thin films. The thin films were consecutively exposed to a tempering program with several rapid thermal annealing (RTA) steps and a final dwell temperature between 500 °C and 1400 °C for 24 h. Grain growth, phase, stoichiometry and macroscopic density of the thin films were analyzed by XRD and SEM. Grain sizes ranged between a few nanometers in diameter at 500 °C and several hundreds of nanometers at 1400 °C.

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Keywords

Processing of Dense Nanocrystalline Zirconia Thin Films by Sol-Gel

  • Christoph Peters (a1), Matthias Bockmeyer (a2), Reinhard Krüger (a3), André Weber (a4) and Ellen Ivers-Tiffée (a5)...

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