Hostname: page-component-8448b6f56d-t5pn6 Total loading time: 0 Render date: 2024-04-20T03:48:48.308Z Has data issue: false hasContentIssue false
  • English
  • Français

Preparation of TiC and TiC/DLC Multilayers by Metal Plasma Immersion Ion Implantation and Deposition: Relationship between Composition, Microstructure and Wear Properties

Published online by Cambridge University Press:  03 September 2012

M. P. Delplancke-Ogletree ,
O. R. Monteiro  and
I. G. Brown
M. P. Delplancke-Ogletree
Affiliation:
Université Libre de Bruxelles, Métallurgie-Electrochimie, 1050 Brussels, Belgium
O. R. Monteiro
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley CA 94,720, USA
I. G. Brown
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley CA 94,720, USA
Get access

Abstract

We have used pulsed vacuum arc deposition to prepare TixCy films and multilayer structures of TixCy / diamondlike carbon (DLC) in a dual plasma source set-up. The composition of the monolithic films was controlled by varying the pulse duration of each plasma gun. During the deposition, a repetitively pulsed bias voltage was applied to the substrate in order to improve the adhesion to the substrate and between the individual layers. For the multilayers, the carbon and Ti guns were synchronously pulsed during deposition of the TixCy, and the Ti gun was not operated during the DLC deposition. Multilayers with different periodicities were synthesized. The deposited films were analyzed by various techniques including XPS, AES, TEM, EELS, and XRD to characterize the composition, bonding states, and microstructure. Special attention was given to the interface thickness in relation to the applied bias voltage. Tribological properties such as friction coefficient and wear resistance were measured, and correlated to the composition and microstructure of the films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 438: Symposium A – Materials Modificaton and Synthesis by Ion Beam… , 1996 , 639
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Upadhya, K., Materials Science ans Engineering A140, 549 (1991)Google Scholar
2. Hatschek, R.L., Am. Mach. 3, 129 (1982)Google Scholar
3. Bertoncello, R., Casagrande, A., Casarin, M., Glisenti, A., Lanzo, E., Mirenghi, L. and Tondello, E., Surf. Interface Anal. 18 ,525 (1992)Google Scholar
4. Monteiro, O.R., Wang, Z., Hou, P. and Brown, I.G., 10th International Conference on Ion Beam Modification of Materials, Albuquerque, MN September 1996 (to be published in NIM-B)Google Scholar
5. Delplancke-Ogletree, M.P. and Monteiro, O.R., submitted to Journal of Applied Physics (1996)Google Scholar
6. Monteiro, O.R. and Brown, I.G., submitted to J. Mater. Res. (1996)Google Scholar
7. Moulder, J.F., Stickle, W.F., Sobol, P.E. and Bomben, F.D., “Handbook of x-ray photoelectron spectroscoty: a reference book of stondard spectra for identification and interpretation of XPS data.”, ed. by Chastain, J. and King, R.C. Jr., Physical Electronics Inc., Eden Prairie, MN, 1995 Google Scholar
8. Barrett, C. and Massaalski, T.B., “Structure of Metals”, 3rd Edition, Pergamon Press, Oxford 1980 Google Scholar
9. Delplancke, M.P., Vassileris, V. and Winand, R., J. Vac. Sci. Technol. A–13 (3), 1104 (1995)Google Scholar