Skip to main content Accessibility help
×
Home

Preparation of pzt thin films on Pt/Ti/SiO2 and Pt/SiO2 Substrates by ECR Plasma Enhanced DC Magnetron Multi-target Reactive Sputtering

  • Sung-Tae Kim (a1), Hyun-Ho Kim (a1), Moon-Yong Lee (a1) and Won-Jong Lee (a1)

Abstract

Perovskite-phase lead zirconate titanate (PZT) thin films were fabricated at 4751C by the electron cyclotron resonance (ECR) plasma enhanced DC magnetron multi-target reactive sputtering method on Pt/Ti/SiO2/Si and Pt/SiO2/Si substrates. Stoichiometric perovskite PZT films were readily obtained on Pt/Ti/SiO2/Si substrates because Ti atoms which were out-diffused to the Pt surface facilitated Pb incorporation by forming lead titanate at the early stage of deposition process. Activation of oxygen by ECR plasma facilitated the oxidation reaction and Pb incorporation into the film. Thus perovskite-phase PZT can be obtained on the Pt/SiO2/Si substrate.

Copyright

References

Hide All
1. Kim, S. T., Kim, J. W., Jung, S. W., Shin, J. S., Ahn, S. T., and Lee, W. J., Mater. Chem. Phys. 45 (1995) 155158.
2. Kim, S. T., Kim, H. H., Lee, M. Y., and Lee, W. J., Jpn. J. Appl. Phys. 36 (1997) 294300.
3. Abe, K., Tomita, H., Toyoda, H., Imai, M. and Yokote, Y.: Jpn. J. Appl. Phys. 30 (1991) 21522154.
4. Hase, T., Sakuma, T., Amanuma, K., Mori, T., Ochi, A. and Miyasaka, Y.: Integrated Ferroelectrics. 8 (1995) 8998.

Preparation of pzt thin films on Pt/Ti/SiO2 and Pt/SiO2 Substrates by ECR Plasma Enhanced DC Magnetron Multi-target Reactive Sputtering

  • Sung-Tae Kim (a1), Hyun-Ho Kim (a1), Moon-Yong Lee (a1) and Won-Jong Lee (a1)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed