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Preparation of a Silicon Oximide Gel via a Non-Aqueous Sol-Gel Route

  • Fei Cheng (a1) and John S. Bradley (a1)


A silicon oximide gel was prepared by a reaction in N,N-dimethylformamide between tris(dimethylamino)silylamine (Me2N)3SiNH2 (TDSA) and formamide in a 1:2 molar ratio at 50C. The 29Si, 13C CP-MAS NMR and IR analyses indicated that the gel mainly comprised oximino silicon networks [SiOC(H)=NSi]x. The gel exhibited a microporous structure and had a total surface area of 339 m2/g. A microporous structure with a BET surface area of 195 m2/g was also obtained after pyrolysis of the gel at 1000°C for 2 h. Pyrolysis of the gel under N2 up to 1485°C gave an amorphous silicon oxycarbonitride glass.



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