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Preparation of a Silicon Oximide Gel via a Non-Aqueous Sol-Gel Route

Published online by Cambridge University Press:  01 February 2011

Fei Cheng  and
John S. Bradley
Fei Cheng
Affiliation:
Department of Chemistry, University of Hull, Cottingham Road, Hull, HU6 7RX, UK Frédéric Lefebvre Laboratoire de Chimie, Organométallique de Surface, 44 bd du 11 November 1918, 69616 Villeurbanne Cedex, France
John S. Bradley
Affiliation:
Department of Chemistry, University of Hull, Cottingham Road, Hull, HU6 7RX, UK Frédéric Lefebvre Laboratoire de Chimie, Organométallique de Surface, 44 bd du 11 November 1918, 69616 Villeurbanne Cedex, France
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Abstract

A silicon oximide gel was prepared by a reaction in N,N-dimethylformamide between tris(dimethylamino)silylamine (Me2N)3SiNH2 (TDSA) and formamide in a 1:2 molar ratio at 50C. The 29Si, 13C CP-MAS NMR and IR analyses indicated that the gel mainly comprised oximino silicon networks [SiOC(H)=NSi]x. The gel exhibited a microporous structure and had a total surface area of 339 m2/g. A microporous structure with a BET surface area of 195 m2/g was also obtained after pyrolysis of the gel at 1000°C for 2 h. Pyrolysis of the gel under N2 up to 1485°C gave an amorphous silicon oxycarbonitride glass.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 726: Symposium Q – Hybrid Organic-Inorganic Materials , 2002 , Q6.21
Copyright
Copyright © Materials Research Society 2002

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