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Photoluminescence Study of Damage Introduced in GaN by Ar- and Kr-Plasmas Etching

  • Yoshitaka Nakano (a1), Retsuo Kawakami (a2), Masahito Niibe (a3), Atsushi Takeichi (a2), Takeshi Inaoka (a2) and Kikuo Tominaga (a2)...

Abstract

We investigated, by employing a photoluminescence technique, the etching damage introduced in near-surface regions of GaN by Ar and Kr plasmas and clarified the differences between the damage characteristics of these regions for the two plasma etching cases. For Ar plasma, the shallow donor-acceptor pair emission at ~3.28 eV was significantly weakened; additionally, a broad blue luminescence band arose at approximately ~3.0 eV. In contrast, for Kr plasma under high gas pressure, we found the recovery of the damage to the same level as the as-grown crystallinity. These differences in the damage characteristics for the two plasma etching cases probably depend upon which atom (N or Ga) is preferentially etched in these cases.

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Photoluminescence Study of Damage Introduced in GaN by Ar- and Kr-Plasmas Etching

  • Yoshitaka Nakano (a1), Retsuo Kawakami (a2), Masahito Niibe (a3), Atsushi Takeichi (a2), Takeshi Inaoka (a2) and Kikuo Tominaga (a2)...

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