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Photoluminescence and Photoluminescence Excitation Spectroscopy of In Situ Er-Doped and Er-Implanted GaN Films Grown by Hydride Vapor Phase Epitaxy

  • S. Kim (a1), X. Li (a1), J. J. Coleman (a1), R. Zhang (a2), D. M. Hansen (a2), T. F. Kuech (a2) and S. G. Bishop (a1)...

Abstract

Photoluminescence (PL) and photoluminescence excitation (PLE) spectroscopy have been carried out at 6K on the 1540 nm 4I13/24I15/2 emission of Er3+ in in situ Er-doped and Er-implanted GaN grown by hydride vapor phase epitaxy (HVPE). The PL and PLE of these two different Er-doped HVPE-grown GaN films are compared with Er-implanted GaN grown by metal organic chemical vapor deposition (MOCVD).

In the in situ Er-doped HVPE-grown GaN, the lineshape of the broad PLE absorption bands and the broad PL bands is similar to that in Er-doped glass. The PL spectra of this in situ Er-doped sample are independent of excitation wavelength, unlike the PL of the Er-implanted GaN. These PL spectra are quite different from the site-selective PL spectra observed in the Er-implanted GaN, indicating that the seven different Er sites existing in the Er-implanted MOCVD-grown GaN are not observed in the in situ Er-doped HVPE-grown GaN. Four of the seven different Er3+ sites observed in the Er-implanted MOCVD-grown GaN annealed at 900°C under a flow of N2 are present in the Er-implanted HVPE-grown GaN annealed at 800°C in an NH 3/H2 atmosphere.

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1. Kim, S., Rhee, S. J., Turnbull, D. A., Reuter, E. E., Li, X., Coleman, J. J., and Bishop, S. G., Appl. Phys. Lett. 71, 231 (1997).
2. Kim, S., Rhee, S. J., Li, X., Coleman, J. J., and Bishop, S. G., Appl. Phys. Lett. 71, 2662 (1997).
3. Kim, S., Rhee, S. J., Li, X., Coleman, J. J., and Bishop, S. G., Mater. Res. Soc. Symp. Proc. 501, to be published (1998).
4. Kim, S., Rhee, S. J., Li, X., Coleman, J. J., and Bishop, S. G., J. Electron. Mater., 27, 246 (1998).
5. Thaik, M., Hommerich, U., Schwartz, R. N., Wilson, R. G., and Zavada, J. M., Appl. Phys. Lett. 70, 2641 (1997).
6. Wu, X., Hommerich, U., MacKenzie, J. D., Abernathy, C. R., Pearton, S. J., Schwartz, R. N., Wilson, R. G., and Zavada, J. M., Appl. Phys. Lett. 70, 2126 (1996).
7. Hansen, D. M., Zhang, R., Perkins, N. R., Safvi, S., Zhang, L., Bray, K. L. and Kuech, T. F., Appl. Phys. Lett. 72, 1244 (1998).
8. Turnbull, D. A. and Bishop, S. G., J. Non-Cryst. Solids., 223, 105 (1998).
9. Mott, N. F. and Davis, E. A., Electronic Processes in Non-Crystalline Materials, (Clarendon Press, Oxford, 1979), p. 273.
10. Gan, F., Laser Materials, (World Scientific, New Jersey, 1995), p. 220.
11. Torvik, J. T.. Qui, C. H., Feuerstein, R. J., Pankove, J. I., Namavar, F., J. Appl. Phys. 81, 6343 (1997).

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Photoluminescence and Photoluminescence Excitation Spectroscopy of In Situ Er-Doped and Er-Implanted GaN Films Grown by Hydride Vapor Phase Epitaxy

  • S. Kim (a1), X. Li (a1), J. J. Coleman (a1), R. Zhang (a2), D. M. Hansen (a2), T. F. Kuech (a2) and S. G. Bishop (a1)...

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