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Photoelectrochemical Deposition of Metal Patterns on Semiconductors

Published online by Cambridge University Press:  15 February 2011

Timothy L. Rose ,
Ronald H. Micheels ,
David H. Longendorfer  and
R. David Rauh
Timothy L. Rose
Affiliation:
EIC Laboratories, Inc., 111 Chapel Street, Newton, MA 02158, USA
Ronald H. Micheels
Affiliation:
EIC Laboratories, Inc., 111 Chapel Street, Newton, MA 02158, USA
David H. Longendorfer
Affiliation:
EIC Laboratories, Inc., 111 Chapel Street, Newton, MA 02158, USA
R. David Rauh
Affiliation:
EIC Laboratories, Inc., 111 Chapel Street, Newton, MA 02158, USA
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Abstract

Microscopic metal patterns may be produced on p-type semiconductors using a maskless photoelectrochemical procedure in which electroplating is induced by minority carriers in illuminated portions of a semiconductor electrode. Resolution exceeding l0μ has been achieved for deposits of Au on p-GaAs and Cu on p-Si. “Electroless” imaging and negative photoelectrochemical imaging are also discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 17: Symposium I – Laser Diagnostics and Photochemical Processing for Semiconductor Devices , 1982 , 265
Copyright
Copyright © Materials Research Society 1983

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References

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