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Photoacoustic spectra from copper phthalocyanine films on Si wafers

  • Masato Ohmukai (a1), Hitoshi Kubota (a1) and Yasuo Tsutsumi (a1)

Abstract

Copper phthalocyanine (CuPc) films were deposited on (100) silicon wafers by means of a vacuum evaporation method. We examined the films using photoacoustic (PA) spectroscopy to study their optical absorption properties. It was clarified that the PA signal from the silicon substrate can be excluded with a chopping frequency of 200 Hz when the film thickness is greater than 4.4 m. We detected an absorption band at 1.128 eV.

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