There is a growing interest in the deposition and processing of thin films at low temperatures to eliminate the inherent problems associated with high temperature processing. Photo enhanced processing is one of the techniques which has received considerable interest. One of the major limitations of photo processing is the lack of sufficiently intense ultra-violet (UV) sources. To date the low pressure Hg lamp has been the only available source for large area UV processing and this has limited the types and quality of films deposited.
In this paper we will outline the design of a novel, variable wavelength excimer discharge lamp which can be used for depositing thin films over large substrate areas. We shall also discuss the direct (i.e. without intermediate photosensitisation reactions) photo induced deposition of thin silicon dioxide films using SiH4 and N2O which are photo dissociated by 126nm photons generated by the excimer lamp described.