Skip to main content Accessibility help
×
Home

Photo Induced Deposition of Thin Silicon Dioxide Films Using a Novel Large Area Excimer Lamp

  • P. Patel (a1), U. Kogelschatz (a2), P. Bergonzo (a1) and I. W. Boyd (a1)

Abstract

There is a growing interest in the deposition and processing of thin films at low temperatures to eliminate the inherent problems associated with high temperature processing. Photo enhanced processing is one of the techniques which has received considerable interest. One of the major limitations of photo processing is the lack of sufficiently intense ultra-violet (UV) sources. To date the low pressure Hg lamp has been the only available source for large area UV processing and this has limited the types and quality of films deposited.

In this paper we will outline the design of a novel, variable wavelength excimer discharge lamp which can be used for depositing thin films over large substrate areas. We shall also discuss the direct (i.e. without intermediate photosensitisation reactions) photo induced deposition of thin silicon dioxide films using SiH4 and N2O which are photo dissociated by 126nm photons generated by the excimer lamp described.

Copyright

References

Hide All
1. Patel, P. and Boyd, Ian W., Appl. Surf. Sci. 46, 352, (1990)
2. Nayar, V., Patel, P. and Boyd, Ian W., Electronics Letters 26, 205 (1990)
3. Vinckier, C. and De Jaegere, S., J. Electrochem. Soc. 137, 628 (1990)
4. Buchanan, D. A., Appl. Phys. Lett. 56, 1037 (1990)
5. Suemitsu, M., Kaneko, T., Miymoto, N., Japan. J. Appl. Phys. 28, 2421 (1989)
6. Marks, J. and Robertson, R. E., Appl. Phys. Lett. 52, 810 (1988)
7. Krusor, B. S., Biegelsen, D. K., Yingling, R. D., Abelson, J. R., J. Vac. Sci. Technol. B7, 129 (1989)
8. Boyd, Ian W., Laser Processing of Thin Films and Microstructures Springer-Verlag, New York, (1987)
9. Padmanabham, R. and Miller, B. J., J. Vac. Sci. Technol. A4, 363 (1986)
10. Usami, K., Mochizuki, Y., Minagawa, T., Iida, A., Gohshi, Y., Japan. J. Appl. Phys. 25, 1449 (1986)
11. Boyer, P. K., Roche, G. A., Ritchie, W., Collins, G., Appl. Phys. Lett. 40, 716 (1982)
12. Meek, J. M. and Craggs, J. D., Electrical Breakdown of Gases, Wiley Interscience Publications, 1978
13. Eliasson, B., Kogelschatz, U. and Stein, H. J., EPA NewsLetter 32, 29 (1988)
14. Eliasson, B. and Kogelschatz, U., J. Phys. D: Appl. Phys. 20, 1421 (1987)
15. Rhodes, Ch. K., Excimer Lasers, Topics in Appl. Phys. Vol 30, Springer, Berlin (1984)
16. Eliason, B. and Kogelschatz, U., Appl. Phys. B. 46, 299 (1988)

Photo Induced Deposition of Thin Silicon Dioxide Films Using a Novel Large Area Excimer Lamp

  • P. Patel (a1), U. Kogelschatz (a2), P. Bergonzo (a1) and I. W. Boyd (a1)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed