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Phase Formation of Platinum Silicides Formed by Ion Implantation

Published online by Cambridge University Press:  28 February 2011

Nader M. Kalkhoran ,
F. Namavar ,
D. Perry  and
E. Cortesi
Nader M. Kalkhoran
Affiliation:
Spire Corporation, Bedford, MA
F. Namavar
Affiliation:
Spire Corporation, Bedford, MA
D. Perry
Affiliation:
Purdue University, West Lafayette IN
E. Cortesi
Affiliation:
Spire Corporation, Bedford, MA
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Abstract

We have studied the formation of platinum silicide layers by ion implantation and annealing, and have determined the dependence of platinum silicide phase formation on ion implantation conditions and substrate orientation. The results indicate that in most cases, the ion implanted layer consists of PtSi phase. However, depending on the implantation and annealing conditions and substrate orientation, other phases, including Pt2Si, Pt3Si, and Pt12Si5, as well as Si and Pt microcrystals, also form.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 235: Symposium A – Phase Formation and Modification by Beam-Solid Interactions , 1991 , 325
Copyright
Copyright © Materials Research Society 1992

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References

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